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Patent Agency Ranking
公开(公告)号：ZA795270B
公开(公告)日：1980-09-24
申请号：ZA795270
申请日：1979-10-03
Applicant: IBM
Abstract: A very low concentration trivalent chromium plating bath in which the source of chromium is an aqueous solution of a chromium (III)- thiocyanate complex (Cr less than 0.03 M) gives a deposit of unexpectedly light colour. Such a bath is employed to produce thin overcoatings of light coloured chromium and may replace the rinse tank of a first chromium (III)- thiocyanate process which is optimized for efficiency and bath stability rather than colour.
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公开(公告)号：BR8004067A
公开(公告)日：1981-01-21
申请号：BR8004067
申请日：1980-06-27
Applicant: IBM
Inventor： VIGAR J
IPC: C25D3/06
Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.
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公开(公告)号：BR7907324A
公开(公告)日：1980-07-15
申请号：BR7907324
申请日：1979-11-12
Applicant: IBM
Abstract: A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light color. Such a bath is employed to produce thin overcoatings of light colored chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.
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