1.
    发明专利
    未知

    公开(公告)号:DE2357232A1

    公开(公告)日:1974-06-20

    申请号:DE2357232

    申请日:1973-11-16

    Applicant: IBM

    Abstract: The present invention relates to circuit means for use in combination with an electron beam projection system of the type wherein an image is projected onto a wafer by means of a scanning electron beam. The circuit means is employed to provide a regulated scan rate. In the system either the secondary electron current from the wafer or the wafer current itself is used to drive a pre-amplifier, the output of which is sent to a pair of attenuator networks to provide scan control. The outputs of the attenuators are fed to a pair of integrating amplifiers, the outputs of which are used to drive a pair of deflection amplifiers after passing through a pair of scan limit detectors and flyback circuits. The outputs of the deflection amplifiers are used to drive the X and Y deflection coils located before the final condenser lens.

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