公开(公告)号：DE69300616T2

公开(公告)日：1996-05-30

申请号：DE69300616

申请日：1993-03-23

Applicant: IBM

Inventor： SACHDEV KRISHNA G ,  SACHDEV HARBANS S ,  WHITAKER JOEL R

IPC: G03F7/023 ,  C08G77/388 ,  C08G77/392 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30 ,  C08G77/38

Abstract: Photo sensitive silicon-containing resist compositions comprising silsesquioxane and aromatic siloxane esters with diazonaphthoquinone sulfonyl groups for imageable O2 RIE barrier films, and method for using the same.

公开(公告)号：DE69300616D1

公开(公告)日：1995-11-16

申请号：DE69300616

申请日：1993-03-23

Applicant: IBM

Inventor： SACHDEV KRISHNA G ,  SACHDEV HARBANS S ,  WHITAKER JOEL R

IPC: G03F7/023 ,  C08G77/388 ,  C08G77/392 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30 ,  C08G77/38

Abstract: Photo sensitive silicon-containing resist compositions comprising silsesquioxane and aromatic siloxane esters with diazonaphthoquinone sulfonyl groups for imageable O2 RIE barrier films, and method for using the same.