公开(公告)号：DE602005007776D1

公开(公告)日：2008-08-07

申请号：DE602005007776

申请日：2005-10-18

Applicant: IBM

Inventor： COLBURN MATTHEW E ,  MARTIN YVES C ,  RETTNER CHARLES T ,  VAN KESSEL THEODORE G ,  WICKRAMASINGHE HEMATHA K

IPC: G03F7/00

Abstract: A method (and resultant structure) of forming a plurality of masks, includes creating a reference template, using imprint lithography to print at least one reference template alignment mark on all of a plurality of mask blanks for a given chip set, and printing sub-patterns on each of the plurality of mask blanks, and aligning the sub-patterns to the at least one reference template alignment mark.