中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

5 records (took 0.073 seconds)

    Anti-holdover charging circuit for flash lamp
    2.
    发明授权
    Anti-holdover charging circuit for flash lamp 失效
    防闪光灯充电电路

    公开(公告)号：US3882358A

    公开(公告)日：1975-05-06

    申请号：US37384873

    申请日：1973-06-26

    Applicant: IBM

    Inventor： DESKEVICH STEPHEN ,  PEACOCK JAMES C ,  TYNAN RICHARD F ,  WILSON ALAN D

    IPC: H05B41/30 ,  H05B37/00

    CPC classification number: H05B41/30

    Abstract: Charging circuit for a flash lamp in which flash holdover is prevented by establishing a high impedance charging circuit for a predetermined time after flash initiation to allow deionization of the lamp plasma and, after a predetermined time, establishing a low impedance charging circuit to provide a fast charging rate for the energy storage device. Impedance levels are changed in the circuit by gating a silicon controlled rectifier (SCR) with a control signal a predetermined time after flash initiation so as to bypass a high impedance circuit path in parallel therewith. As the energy storage device becomes fully charged, the SCR returns to its blocking condition, the control signal terminates and the lamp can be fired again.

    Abstract translation: 用于闪光灯的充电电路，其中通过在闪光开始之后建立高阻抗充电电路达预定时间来防止闪光灯保持，以允许灯等离子体去离子，并且在预定时间之后建立低阻抗充电电路以提供快速 储能装置的充电率。 通过在闪光开始之后的预定时间内通过控制信号选通可控硅整流器（SCR），以便与其并联的高阻抗电路路径旁路，在电路中改变阻抗水平。 当能量存储装置充满电时，SCR返回到其阻塞状态，控制信号终止并且灯可以再次点火。

    POSITIONING SYSTEM
    4.
    发明专利
    POSITIONING SYSTEM 未知

    公开(公告)号：CA1229429A

    公开(公告)日：1987-11-17

    申请号：CA495092

    申请日：1985-11-12

    Applicant: IBM

    Inventor： BEUMER KARL W ,  GASTON CHARLES A ,  LOCKE CHARLES H ,  MACK ALFRED ,  O'NEILL BRIAN C ,  PINCKNEY WARREN J ,  WILSON ALAN D

    IPC: H01L21/30 ,  H01J37/20 ,  H01L21/027 ,  H01L21/68 ,  H01L21/72

    Abstract: POSITIONING SYSTEM A high precision, high throughput submicrometer worpiece positioning system, particularly useful as a workpiece positioning means in electron beam lithography tools, is disclosed. The positioning system increases mechanical stability by essentially eliminating mechanical hysteresis, which allows state of the art electron beam lithograpny systems to provide the repeatable, accurate and dense circuit patterns that modern semiconductor trends demand. The positioning system comprises a movable positioning table, a workpiece supporting superstructure which is elastically joined to the movable positioning table by three geometrically distinct kinematic support means and a two-stage coupling means which mounts a workpiece to the workpiece supporting superstructure. A laser interferometer locating-positioning system is used to position the workpiece. The interferometer mirrors are integral with the workpiece supporting superstructure. The coupling means mounts a workpiece to the workpiece supporting superstructure with a minimum of mechanical distortion. Three two-stage coupling means are used. The first stage is removable from the positioning, and allows for workpiece loading and unloading outside of the positioning system. The removable stage comprises an integral unit which includes two opposing arms with large radii spherical ends and a tab member. The spherical end center lines are colinear, providing for vertical clamping of the workpiece. The second stage is stationary and integral with the workpiece supporting superstructure. The stationary stage comprises two opposing arms with large radii spherical ends and clamps the tab of the removable stage by vertical clamping.

Patent Agency Ranking