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1.Coated semiconductor structures and methods of forming protective coverings on such structures 失效
Title translation: 在这种结构上形成保护层的涂层半导体结构和方法公开(公告)号:US3760242A
公开(公告)日:1973-09-18
申请号:US3760242D
申请日:1972-03-06
Applicant: IBM
IPC: H01L21/316 , H01L23/29 , H01L23/485 , H01L3/10 , H01L3/00
CPC classification number: H01L23/291 , H01L21/02126 , H01L21/02164 , H01L21/0217 , H01L21/02211 , H01L21/02216 , H01L21/02238 , H01L21/02255 , H01L21/02266 , H01L21/02271 , H01L21/31612 , H01L23/29 , H01L23/485 , H01L2924/0002 , H01L2924/00
Abstract: A semiconductor structure with a metallic oxide coated surface, a silicon nitride coating on the metal oxide and a covering coating of glass over the coated surface.
Abstract translation: 具有金属氧化物涂覆表面的半导体结构,金属氧化物上的氮化硅涂层和涂覆表面上的玻璃覆盖涂层。