公开(公告)号：DE3379187D1

公开(公告)日：1989-03-16

申请号：DE3379187

申请日：1983-04-20

Applicant: IBM

Inventor： AMENDOLA ALBERT ,  CHRISTENSEN RICHARD GILBERT ,  YEREANCE JOHN GERALD

IPC: H05K3/00 ,  G03F1/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/48 ,  H05K3/14 ,  H05K3/24

Abstract: This invention concerns method and apparatus for making a mask (214) conforming to a cured MLC substrate (78). The mask (214) when made may be used to add layers of metallization to the cured substrate (78) by conventional photolithographic techniques. The method and apparatus feature use of the cured substrate (78) itself to pattern the mask (214). Particularly, the substrate (78) is aligned with the unpatterned mask (214) and the image of the substrate (78) transferred to the mask (214) such that once patterned, the mask (214) may subsequently be realigned with the substrate (78). A system of posts (202, 204) and notches (226, 232) and grooves (228,234) is used to align the substrate (78) and mask (214) and a lens system used to transfer the substrate image to the mask (214).