公开(公告)号：DE3480628D1

公开(公告)日：1990-01-04

申请号：DE3480628

申请日：1984-09-21

Applicant: IBM

Inventor： CHRISTENSEN RICHARD GILBERT ,  MOORE ROBERT LOUIS

IPC: C08F20/56 ,  G03F7/00 ,  H01L21/3213 ,  H01L21/48 ,  H01L23/538 ,  H05K3/06 ,  H05K3/14 ,  H05K3/24 ,  G03F7/02

公开(公告)号：DE2651976A1

公开(公告)日：1977-07-14

申请号：DE2651976

申请日：1976-11-15

Applicant: IBM

Inventor： CHRISTENSEN RICHARD GILBERT

IPC: C23C14/50 ,  H01L21/285 ,  C23C13/08

Abstract: PLANETARY EVAPORATOR A planetary evaporator having at least one source of material for coating, by evaporation, workpieces such as semiconductor wafers. The apparatus includes a pallet mounted for rotation about its own axis, and substrate or workpiece holders on the pallet which are mounted for rotation therewith. Guides support the pallets and a cam follower on the pallet follows a cam to effect reciprocation of the pallet as it rotates, the guides being adapted for rotation about another axis which is substantially perpendicular to the axis of rotation of the pallet. In another embodiment the substrate holders are also rotated so as to give four degrees of freedom of the workpiece or substrate relative to the material source. The purpose of this abstract is to enable the public and the Patent Office to determine rapidly the subject matter of the technical disclosure of the Application. This abstract is neither intended to define the invention of the Application nor is it intended to be limiting as to the scope thereof.

公开(公告)号：DE3379187D1

公开(公告)日：1989-03-16

申请号：DE3379187

申请日：1983-04-20

Applicant: IBM

Inventor： AMENDOLA ALBERT ,  CHRISTENSEN RICHARD GILBERT ,  YEREANCE JOHN GERALD

IPC: H05K3/00 ,  G03F1/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/48 ,  H05K3/14 ,  H05K3/24

Abstract: This invention concerns method and apparatus for making a mask (214) conforming to a cured MLC substrate (78). The mask (214) when made may be used to add layers of metallization to the cured substrate (78) by conventional photolithographic techniques. The method and apparatus feature use of the cured substrate (78) itself to pattern the mask (214). Particularly, the substrate (78) is aligned with the unpatterned mask (214) and the image of the substrate (78) transferred to the mask (214) such that once patterned, the mask (214) may subsequently be realigned with the substrate (78). A system of posts (202, 204) and notches (226, 232) and grooves (228,234) is used to align the substrate (78) and mask (214) and a lens system used to transfer the substrate image to the mask (214).

公开(公告)号：FR2337207A1

公开(公告)日：1977-07-29

申请号：FR7636399

申请日：1976-11-29

Applicant: IBM

Inventor： CHRISTENSEN RICHARD GILBERT

IPC: C23C14/50 ,  H01L21/285 ,  C23C13/08

Abstract: PLANETARY EVAPORATOR A planetary evaporator having at least one source of material for coating, by evaporation, workpieces such as semiconductor wafers. The apparatus includes a pallet mounted for rotation about its own axis, and substrate or workpiece holders on the pallet which are mounted for rotation therewith. Guides support the pallets and a cam follower on the pallet follows a cam to effect reciprocation of the pallet as it rotates, the guides being adapted for rotation about another axis which is substantially perpendicular to the axis of rotation of the pallet. In another embodiment the substrate holders are also rotated so as to give four degrees of freedom of the workpiece or substrate relative to the material source. The purpose of this abstract is to enable the public and the Patent Office to determine rapidly the subject matter of the technical disclosure of the Application. This abstract is neither intended to define the invention of the Application nor is it intended to be limiting as to the scope thereof.