公开(公告)号：DE2139836A1

公开(公告)日：1973-02-22

申请号：DE2139836

申请日：1971-08-09

Applicant: IBM DEUTSCHLAND

Inventor： MAKOSCH GUENTER DIPL PHYS ,  JAERISCH WALTER DIPL PHYS DR

IPC: G01B11/24 ,  G01B11/30 ,  G02B27/60 ,  G03H1/00

Abstract: Apparatus and method of measuring surface irregularities by means of the interference field occurring behind a diffraction grid. Light bars are generated which are reflected from the surface to be tested back onto the grid. If the surface includes irregularities down to 1 micron and under, moire patterns which are a function of the height and width of the irregularities become visible on the opposite side of the grid. By suitably selecting the direction of observation, the moire patterns are superimposed by interference fringes which permit the moire patterns to be accurately gauged.

公开(公告)号：DE3020022A1

公开(公告)日：1981-12-03

申请号：DE3020022

申请日：1980-05-24

Applicant: IBM DEUTSCHLAND

Inventor： HAEUSLER GERD DIPL PHYS DR ,  JAERISCH WALTER DIPL PHYS DR ,  MAKOSCH GUENTER DIPL PHYS

IPC: G01B9/02 ,  G01M11/00 ,  G01M11/02 ,  G01B11/14 ,  H01L21/66 ,  H01L21/70

Abstract: Optical imaging systems are used for making microstructures, and have to be very precise. In order to test these imaging systems, a new method, and a device for carrying out this method, are described in which two interferograms are made and compared. In a first step, an interferogram of an original pattern is made, followed by a second step in which an interferogram of a copy of the original pattern is produced using the identical conditions used to form the first interferogram. The pattern copy is made in the imaging system to be tested. In a third step, the two interferograms are compared with one another to provide a measure of the accuracy of the imaging system. This technique can be used for testing imaging systems which produce only a mirror image.

公开(公告)号：DE3404673A1

公开(公告)日：1985-08-14

申请号：DE3404673

申请日：1984-02-10

Applicant: IBM DEUTSCHLAND

Inventor： ELSNER GERHARD DIPL PHYS DR ,  JAERISCH WALTER DIPL PHYS DR ,  KORTH HANS-ERDMANN DIPL PHYS ,  MAKOSCH GUENTER DIPL PHYS

IPC: G02B5/32 ,  G03F7/20 ,  G03H1/04 ,  G11B5/84

Abstract: In order to generate large-area, periodic patterns, the substrates (9) covered with a photosensitive layer are brought into the interference field (8) which is produced by four plane, mutually inclined waves. The plane waves are produced by splitting a laser beam (1) in a holographic lattice grating (2) which directs the total incident light energy into the four first diffraction orders. In order to collimate the diffraction beam, use is preferably made of large-area mirror optical systems by means of which the angle of inclination of the plane waves with respect to one another can be varied. It is possible to produce with the aid of the photolithographic device magnetic surface memories having vertical, insular magnetisation domains, or other surfaces which are covered with closely packed, vertical needles.

公开(公告)号：DE2931668A1

公开(公告)日：1981-02-19

申请号：DE2931668

申请日：1979-08-04

Applicant: IBM DEUTSCHLAND

Inventor： MAKOSCH GUENTER DIPL PHYS

IPC: G03F9/00 ,  H01L23/544 ,  H01L21/32

Abstract: The projection printing system for making integrated circuits has a light source (1) producing a divergent beam (13), followed by a condenser lens system (2), a mirror (4), a further lens (5) and a filter (8) which can be swung into position above the semiconductor plate (9) which is placed on a table (10) underneath. An observation lens (12) is in line with the mirror, which is at an angle, so that the plate can be viewed. A mask (20) is mounted under the condenser lens system. The opening (6) through the filter has reflectively coated sides (7) which taper inwards towards the bottom to increase the degree of convergence of the beam. It is used to convert markings (21) on the mask into dark field markings for alignment purposes.

公开(公告)号：DE2627609A1

公开(公告)日：1977-12-29

申请号：DE2627609

申请日：1976-06-19

Applicant: IBM DEUTSCHLAND

Inventor： JAERISCH WALTER DIPL PHYS DR ,  MAKOSCH GUENTER DIPL PHYS ,  SCHMACKPFEFFER ARNO DIPL PHYS

IPC: G01B11/00 ,  G01B9/02 ,  G01B11/24 ,  G01B11/30 ,  G01N21/956 ,  G01M11/00 ,  H01L21/66 ,  G01B9/021

Abstract: Disclosed is an interferometric apparatus and method for the inspection and detection of overlay errors characterized in that two plane polarized laser beams are directed onto the surface to be inspected, the angle included by these two beams being dimensioned in such a way that the radiation generating the plus or minus first order of the diffraction pattern of one beam is parallel to the other beam, thus generating an interference field which in the absence of overlay errors consists of an homogeneous fringe pattern while in the presence of such errors the fringe pattern is locally distorted. In a first embodiment, a first component of a laser beam is deflected onto a viewing screen by a beam splitter while a second component passes through the beam splitter to a mirror. The position and angle of the mirror is determined by the first order diffraction characteristics of the grating (object). The second component provides a first order of diffraction which interferes with the first component, producing an interference pattern on the viewing screen.