公开(公告)号：DE2439208A1

公开(公告)日：1976-03-11

申请号：DE2439208

申请日：1974-08-16

Applicant: IBM DEUTSCHLAND

Inventor： FROSCH ALBERT DIPL PHYS ,  SCHMACKPFEFFER ARNO DIPL PHYS

IPC: G02B27/00 ,  G03F7/20 ,  H01L21/027 ,  G03F1/00 ,  G03B27/16 ,  H01L21/312 ,  H01L21/47 ,  H05K3/00

公开(公告)号：DE2627609A1

公开(公告)日：1977-12-29

申请号：DE2627609

申请日：1976-06-19

Applicant: IBM DEUTSCHLAND

Inventor： JAERISCH WALTER DIPL PHYS DR ,  MAKOSCH GUENTER DIPL PHYS ,  SCHMACKPFEFFER ARNO DIPL PHYS

IPC: G01B11/00 ,  G01B9/02 ,  G01B11/24 ,  G01B11/30 ,  G01N21/956 ,  G01M11/00 ,  H01L21/66 ,  G01B9/021

Abstract: Disclosed is an interferometric apparatus and method for the inspection and detection of overlay errors characterized in that two plane polarized laser beams are directed onto the surface to be inspected, the angle included by these two beams being dimensioned in such a way that the radiation generating the plus or minus first order of the diffraction pattern of one beam is parallel to the other beam, thus generating an interference field which in the absence of overlay errors consists of an homogeneous fringe pattern while in the presence of such errors the fringe pattern is locally distorted. In a first embodiment, a first component of a laser beam is deflected onto a viewing screen by a beam splitter while a second component passes through the beam splitter to a mirror. The position and angle of the mirror is determined by the first order diffraction characteristics of the grating (object). The second component provides a first order of diffraction which interferes with the first component, producing an interference pattern on the viewing screen.

公开(公告)号：DE2523982A1

公开(公告)日：1976-12-16

申请号：DE2523982

申请日：1975-05-30

Applicant: IBM DEUTSCHLAND

Inventor： SCHMACKPFEFFER ARNO DIPL PHYS ,  ZILLER JOERG

IPC: C23C14/28 ,  H01L49/02 ,  H05K3/14 ,  H05K3/10

Abstract: The substrate is exposed at its back, non-coated side to an energy beam, so that the material on it is at least locally evaporated and condensed on the substrate to be coated, and placed near the front side of the device. The support for the material to be deposited is the base surface of a prism, or a similarly working surface; the substrate surface to be coated is place at a small distance (a few mu m) from the surface of the prism. An energy radiation, pref. a laser beam, is directed to the material to be evaporated pref. through an microscope so that after its evaporation practically the whole radiation is totally reflected from the now bare base surface area.

公开(公告)号：DE2411926A1

公开(公告)日：1975-09-25

申请号：DE2411926

申请日：1974-03-13

Applicant: IBM DEUTSCHLAND

Inventor： FROSCH ALBERT DIPL PHYS ,  SCHMACKPFEFFER ARNO DIPL PHYS

IPC: G03F7/20 ,  G03F1/00