公开(公告)号：NL2021301B1

公开(公告)日：2019-04-25

申请号：NL2021301

申请日：2018-07-13

Applicant: ICT INTEGRATED CIRCUIT TESTING GES FUER HALBLEITERPRUEFTECHNIK MBH

Inventor： DIETER WINKLER ,  GUY EYTAN ,  ZVI NIR

IPC: H01J37/04 ,  H01J37/09 ,  H01J37/147 ,  H01J37/28

Abstract: A charged particle beam device is described, which includes: a beam source configured to generate a charged particle beam propagating along an optical axis; an aperture device with a first number of apertures configured to create a first number of beamlets from the charged particle beam, wherein the first number is five or more, wherein the apertures are arranged on a ring line around the optical axis such that perpendiculars of the apertures onto a tangent of the ring line are evenly spaced. The charged particle beam device further includes an electrostatic multipole device configured to individually influence the beamlets. Further, a charged particle beam influencing device and a method of operating a charged particle beam device are described.

公开(公告)号：NL2021301A

公开(公告)日：2019-01-25

申请号：NL2021301

申请日：2018-07-13

Applicant: ICT INTEGRATED CIRCUIT TESTING GES FUER HALBLEITERPRUEFTECHNIK MBH

Inventor： DIETER WINKLER ,  GUY EYTAN ,  ZVI NIR

IPC: G03F7/20 ,  H01J37/147

Abstract: A charged particle beam device is described, which includes: a beam source configured to generate a charged particle beam propagating along an optical axis; an aperture device with a first number of apertures configured to create a first number of beamlets from the charged particle beam, wherein the first number is five or more, wherein the apertures are arranged on a ring line around the optical axis such that perpendiculars of the apertures onto a tangent of the ring line are evenly spaced. The charged particle beam device further includes an electrostatic multipole device configured to individually influence the beamlets. Further, a charged particle beam influencing device and a method of operating a charged particle beam device are described.