公开(公告)号：US09673373B2

公开(公告)日：2017-06-06

申请号：US13967950

申请日：2013-08-15

Applicant: IMEC

Inventor： Steven Brems ,  Paul Mertens

IPC: H01L41/09 ,  B08B3/12 ,  B06B1/06 ,  H01L21/67

CPC classification number: H01L41/09 ,  B06B1/0622 ,  B06B1/0688 ,  B06B2201/20 ,  B06B2201/71 ,  B08B3/12 ,  H01L21/67086

Abstract: This present application relates to a system for delivering megasonic energy to a liquid, involving one or more megasonic transducers, each transducer having a single operating frequency within an ultrasound bandwidth and comprising two or more groups of piezoelectric elements arranged in one or more rows, and a megasonic generator means for driving the one or more transducers at frequencies within the bandwidth, the generator means being adapted for changing the voltage applied to each group of piezoelectric elements so as to achieve substantially the same maximum acoustic pressure for each group of piezoelectric elements. The generator means and transducers being constructed and arranged so as to produce ultrasound within the liquid. Such a system may be part of an apparatus for cleaning a surface of an article such as a semiconductor wafer or a medical implant.

公开(公告)号：US20180047560A1

公开(公告)日：2018-02-15

申请号：US15674151

申请日：2017-08-10

Applicant: IMEC VZW

Inventor： Paul Mertens

IPC: H01L21/02 ,  B08B3/08 ,  B08B3/10 ,  B81C1/00

CPC classification number: H01L21/02057 ,  B08B3/08 ,  B08B3/10 ,  B81C1/00849 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/67109 ,  H01L21/67126 ,  H01L21/67742 ,  H01L29/785

Abstract: A method for performing a wet treatment of a structure is described in the present disclosure. An example method includes obtaining a structure comprising a first surface, wherein the first surfaces comprises a feature fixed at least at a first end to the first surface from which it protrudes, and wherein a sidewall of the feature faces and is positioned away from a second surface by a gap g, performing a wet treatment of the structure and subsequently, drying the structure, wherein performing the wet treatment comprises rinsing the structure by exposing it to a rinsing liquid comprising water, and exposing the structure, subsequently, to a sequence of liquids.

公开(公告)号：US20170076936A1

公开(公告)日：2017-03-16

申请号：US15359355

申请日：2016-11-22

Applicant: IMEC

Inventor： Paul Mertens ,  Steven Brems

IPC: H01L21/02 ,  B08B3/12 ,  B08B3/02 ,  H01L21/67

Abstract: Disclosed are systems and methods for cleaning semiconductor substrates, wherein a nucleation structure having nucleation sites is mounted facing a surface of the substrate to be cleaned. The substrate and structure are brought into contact with a cleaning liquid, which is subsequently subjected to acoustic waves of a given frequency. The nucleation template features easier nucleation formation than the surface that needs to be cleaned by, for example, causing the template to have a higher contact angle when in contact with the liquid than the substrate surface to be clean. Therefore, bubbles nucleate on the structure and not on the surface to be cleaned.

Abstract translation: 公开了用于清洁半导体衬底的系统和方法，其中具有成核位点的成核结构面向要被清洁的衬底的表面安装。 衬底和结构与清洁液接触，清洗液随后经受给定频率的声波。 与需要清洗的表面相比，成核模板具有更容易的成核形成，例如，当与液体接触时，模板具有比要清洁的基底表面更高的接触角。 因此，气泡在结构上成核，而不是待清洁的表面。

公开(公告)号：US20140053864A1

公开(公告)日：2014-02-27

申请号：US13967950

申请日：2013-08-15

Applicant: IMEC

Inventor： Steven Brems ,  Paul Mertens

IPC: H01L41/09 ,  B08B3/12

CPC classification number: H01L41/09 ,  B06B1/0622 ,  B06B1/0688 ,  B06B2201/20 ,  B06B2201/71 ,  B08B3/12 ,  H01L21/67086

Abstract: This present application relates to a system for delivering megasonic energy to a liquid, involving one or more megasonic transducers, each transducer having a single operating frequency within an ultrasound bandwidth and comprising two or more groups of piezoelectric elements arranged in one or more rows, and a megasonic generator means for driving the one or more transducers at frequencies within the bandwidth, the generator means being adapted for changing the voltage applied to each group of piezoelectric elements so as to achieve substantially the same maximum acoustic pressure for each group of piezoelectric elements. The generator means and transducers being constructed and arranged so as to produce ultrasound within the liquid. Such a system may be part of an apparatus for cleaning a surface of an article such as a semiconductor wafer or a medical implant.

Abstract translation: 本发明涉及一种用于将兆声波能量传送到液体的系统，涉及一个或多个兆声换能器，每个换能器在超声波带宽内具有单个工作频率，并且包括两组或多组布置成一行或多行的压电元件，以及 用于在带宽内的频率驱动所述一个或多个换能器的兆声波发生器装置，所述发生器装置适于改变施加到每组压电元件的电压，以便为每组压电元件实现基本上相同的最大声压。 发生器装置和换能器被构造和布置成在液体内产生超声波。 这种系统可以是用于清洁诸如半导体晶片或医疗植入物的物品的表面的设备的一部分。