MEMS resonator with optimized support anchoring
    1.
    发明公开
    MEMS resonator with optimized support anchoring 审中-公开
    MEMS谐振器优化器

    公开(公告)号:EP2479891A1

    公开(公告)日:2012-07-25

    申请号:EP11168324.9

    申请日:2011-05-31

    Applicant: IMEC

    CPC classification number: H03H9/02338 H03H2009/0244 H03H2009/02496

    Abstract: MEMS resonator comprising: a substrate; a resonator body (1) suspended above the substrate by means of clamped-clamped beams (4), each beam comprising two support legs (41, 42) with a common connection (5) to the resonator body, the resonator body (1) being adapted for resonating at an operating frequency (fres); excitation means (6, 7) for exciting the resonator body into a vibration at the operating frequency (fres). Each beam is adapted for oscillating in a flexural mode at a given flexural wavelength as a result of said vibration of said resonator body at said operating frequency (fres). Each leg is acoustically long with respect to said flexural wavelength of the beam.

    Abstract translation: MEMS谐振器,包括:基板; 谐振器体(1),其通过夹紧的梁(4)悬挂在基板上方,每个梁包括具有与谐振器主体的共同连接(5)的两个支撑腿(41,42),谐振器主体(1) 适于以工作频率(fres)谐振; 激励装置(6,7),用于将谐振器体激发成工作频率(fres)的振动。 作为所述谐振器本体在所述工作频率(fres)下的所述振动的结果,每个光束适于以给定弯曲波长的弯曲模式振荡。 相对于梁的所述弯曲波长,每条腿在声学上是长的。

    GROUP III-NITRIDE BASED VERTICAL POWER DEVICE AND SYSTEM

    公开(公告)号:EP3686924A1

    公开(公告)日:2020-07-29

    申请号:EP19153573.1

    申请日:2019-01-24

    Applicant: IMEC vzw

    Abstract: A vertical power device having a top side and a bottom side, the vertical power device comprising a substrate; a layered group III-Nitride based device stack formed atop the substrate, the group III-Nitride based device stack; a first vertical group III-Nitride based device and a second vertical group III-Nitride based device formed in the group III-Nitride based device stack, wherein the first vertical group III-Nitride based device and the second vertical group III-Nitride based device are electrically connected; and a first vertical device isolation structure that isolates the first vertical group III-Nitride based device from the second vertical group III-Nitride based device. A vertical power system integrating vertical power devices. A process for fabricating a vertical power device.

    METHOD FOR MANUFACTURING AN III-NITRIDE SEMICONDUCTOR STRUCTURE

    公开(公告)号:EP3813096A1

    公开(公告)日:2021-04-28

    申请号:EP19204534.2

    申请日:2019-10-22

    Applicant: Imec VZW

    Abstract: The present disclosure relates to a method for manufacturing an III-nitride semiconductor structure comprising providing a substrate (150) comprising a first layer (333) having an upper surface (51, 65) of monocrystalline III-nitride material,; providing, over the upper surface, a patterned dielectric layer comprising a first dielectric feature (10); loading the substrate into a process chamber; exposing the substrate (150) to a first gas mixture comprising at least one Group III-metal organic precursor gas, a nitrogen containing gas and hydrogen gas at a predetermined temperature, thereby forming, on the upper surface, a second layer (52, 61) of a monocrystalline III-nitride material by area selective growth wherein two opposing sidewalls of the dielectric feature are oriented parallel to one of the {11-20} crystal planes of the first layer such that upon formation of the second layer of the monocrystalline III-nitride material a first trench (81) having tapered sidewalls (82)is formed so that the crystal plane of the second layer parallel to the tapered sidewalls is one of the {1-101} crystal planes.

    GROUP III NITRIDE BASED SEMICONDUCTOR DEVICE
    4.
    发明公开
    GROUP III NITRIDE BASED SEMICONDUCTOR DEVICE 审中-公开
    III族氮化物基半导体器件

    公开(公告)号:EP3217433A1

    公开(公告)日:2017-09-13

    申请号:EP17159548.1

    申请日:2017-03-07

    Applicant: IMEC vzw

    Abstract: The invention is related to a III-Nitride semiconductor device comprising a base substrate (1), a buffer layer (2), a channel layer (3), a barrier layer (4) so that a 2-dimensional charge carrier gas (5) is formed or can be formed near the interface between the channel layer (3) and the barrier layer (4), and at least one set of a first and second electrode (6,7) in electrical contact with the 2-dimensional charge carrier gas (5), wherein the device further comprises a mobile charge layer (MCL) (11) within the buffer layer (2) or near the interface between the buffer layer (2) and the channel layer, when the device is in the on-state. The device further comprises (3) an electrically conductive path (12) between one of the electrodes (6,7) and the mobile charge layer (11). The invention is equally related to a method for producing a device according to the invention.

    Abstract translation: 本发明涉及包括基础衬底(1),缓冲层(2),沟道层(3),阻挡层(4)的III族氮化物半导体器件,从而使得二维电荷载体气体 )形成或可形成在沟道层(3)与阻挡层(4)之间的界面附近,并且至少一组第一和第二电极(6,7)与二维电荷 (5),其中所述器件进一步包括在所述器件处于所述缓冲层(2)内时或在所述缓冲层(2)与所述沟道层之间的界面附近的移动电荷层(MCL) 导通状态。 该装置还包括(3)电极(6,7)中的一个与移动电荷层(11)之间的导电路径(12)。 本发明同样涉及用于制造根据本发明的装置的方法。

    Temperature compensation device and method for MEMS resonator
    5.
    发明公开
    Temperature compensation device and method for MEMS resonator 审中-公开
    Temperaturausgleichsvorrichtung und Verfahrenfüreinen MEMS-Resonator

    公开(公告)号:EP2348633A1

    公开(公告)日:2011-07-27

    申请号:EP11151680.3

    申请日:2011-01-21

    Applicant: IMEC

    CPC classification number: H03H9/02448

    Abstract: The invention relates to a device comprising a MEM resonating element (20), provided for resonating at a predetermined resonance frequency and having at least one temperature dependent characteristic, a heating means (40), comprising a tunable thermal radiation source (40) for heating the MEM resonating element to an offset temperature (T offset ), a sensing means (11, 12), associated with the MEM resonating element and provided for sensing its temperature dependent characteristic, and a control circuit (30), connected to the sensing means (11, 12) for receiving measurement signals indicative of the sensed temperature dependent characteristic and connected to the heating means (40) for supplying a control signal (31) thereto, to maintain the temperature of the MEM resonating element (20) at the offset temperature.

    Abstract translation: 本发明涉及一种装置,包括一个用于以预定谐振频率谐振并具有至少一个温度依赖特性的MEM谐振元件(20),一个加热装置(40),包括一个用于加热的可调热辐射源(40) 将所述MEM谐振元件设置到偏移温度(T offset),与所述MEM谐振元件相关联并被提供用于感测其温度依赖特性的感测装置(11,12)以及连接到所述感测装置的控制电路(30) (11,12),用于接收指示感测到的温度依赖特性的测量信号,并连接到用于向其提供控制信号(31)的加热装置(40),以将MEM谐振元件(20)的温度保持在偏移 温度。

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