公开(公告)号：DE19911413B4

公开(公告)日：2005-10-27

申请号：DE19911413

申请日：1999-03-15

Applicant: INFINEON TECHNOLOGIES AG

Inventor： EISELE-KOHLER ARTUR ,  LEUSCHNER RAINER ,  LIPINSKI MATTHIAS

IPC: B01D67/00 ,  B01D69/12 ,  C08J5/22 ,  H01M2/16 ,  H01M8/02 ,  H01M8/0289 ,  H01M8/10 ,  H01M8/1009 ,  H01M8/1053 ,  H01M8/1069 ,  H01M10/05

Abstract: Production of cationic exchange membrane thin layers containing sulfonic acid groups comprises using plasma deposition. Organic monomers as the starting compounds which have a boiling point of not more than 300 deg C at a pressure of 1 bar and are chemically stable at this temperature and are non corrosive. The plasma deposition is carried out in a non-pulsed plasma or in a pulsed plasma with an average power density that is 1.5 times the plasma ignition power density. Sulfonic acid groups are built into the deposited thin layer by treating with an aqueous hydrogen sulfite solution.