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公开(公告)号:WO2004008543A9
公开(公告)日:2004-10-07
申请号:PCT/EP0307553
申请日:2003-07-11
Applicant: INFINEON TECHNOLOGIES AG , BOECK JOSEF , MEISTER THOMAS , ROMANYUK ANDRIY , SCHAEFER HERBERT
Inventor: BOECK JOSEF , MEISTER THOMAS , ROMANYUK ANDRIY , SCHAEFER HERBERT
IPC: H01L21/28 , H01L21/331 , H01L29/167 , H01L29/417 , H01L29/423 , H01L29/732
CPC classification number: H01L29/41708 , H01L29/167 , H01L29/42304 , H01L29/732
Abstract: According to the invention, the base resistance may be reduced and thus a low-resistance base electrode of a bipolar transistor produced, whereby a polysilicon layer is used as base electrode (2) in which impurity atoms, in particular C atoms are applied, which provide a high density of lattice holes in the polysilicon layer.
Abstract translation: 为了降低基极电阻,从而实现了双极晶体管作为基极电极(2)的低电阻基极电极时,多晶硅层,是在国外原子,特别是C原子,被引入,其引起晶格空位的在多晶硅层的高密度。
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公开(公告)号:AU2003250940A1
公开(公告)日:2004-02-02
申请号:AU2003250940
申请日:2003-07-11
Applicant: INFINEON TECHNOLOGIES AG
Inventor: MEISTER THOMAS , ROMANYUK ANDRIY , SCHAFER HERBERT , BOCK JOSEF
IPC: H01L21/28 , H01L21/331 , H01L29/167 , H01L29/417 , H01L29/423 , H01L29/732
Abstract: A bipolar transistor and method of making a bipolar transistor is disclosed. In one embodiment, the bipolar transistor includes a polysilicon layer into which impurity atoms are inserted, thereby reducing the layer resistance.
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公开(公告)号:DE10231407B4
公开(公告)日:2007-01-11
申请号:DE10231407
申请日:2002-07-11
Applicant: INFINEON TECHNOLOGIES AG
Inventor: ROMANYUK ANDRIY , MEISTER THOMAS , BOECK JOSEF , SCHAEFER HERBERT
IPC: H01L21/28 , H01L29/732 , H01L21/331 , H01L29/167 , H01L29/417 , H01L29/423
Abstract: A bipolar transistor and method of making a bipolar transistor is disclosed. In one embodiment, the bipolar transistor includes a polysilicon layer into which impurity atoms are inserted, thereby reducing the layer resistance.
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公开(公告)号:DE10231407A1
公开(公告)日:2004-02-19
申请号:DE10231407
申请日:2002-07-11
Applicant: INFINEON TECHNOLOGIES AG
Inventor: ROMANYUK ANDRIY , MEISTER THOMAS , BOECK JOSEF , SCHAEFER HERBERT
IPC: H01L21/28 , H01L21/331 , H01L29/167 , H01L29/417 , H01L29/423 , H01L29/732
Abstract: A bipolar transistor and method of making a bipolar transistor is disclosed. In one embodiment, the bipolar transistor includes a polysilicon layer into which impurity atoms are inserted, thereby reducing the layer resistance.
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