Patent search ap:("INFINEON TECHNOLOGIES AG") AND inv:"SCHEDLBAUER OLIVER" Page 1

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发明专利
Use of a mixture of a fluorine-containing and chlorine-containing gas for cleaning atomic layer deposition reactors used in semiconductor technology 未知

公开(公告)号：DE10344612A1

公开(公告)日：2005-05-04

申请号：DE10344612

申请日：2003-09-25

Applicant: INFINEON TECHNOLOGIES AG

Inventor： HINTZE BERND , WODARZ MARK , WINZIG HUBERT , GSCHWANDTNER ALEXANDER , SCHEDLBAUER OLIVER

IPC: C23C16/44 , H01L21/314 , C23F4/00

Abstract: Use of a mixture of a fluorine-containing and chlorine-containing gas for cleaning atomic layer deposition reactors in which the reaction mixture produced is fed into the reaction chamber to remove residues in the reactor chamber.

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