Patent search ap:("INFINEON TECHNOLOGIES AG") AND inv:"TSCHISCHGALE JOERG" Page 1

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发明专利
Photo-mask`s structural unit transmitting arrangement for integrated circuit, has optical unit causing local variation of transmission rate of radiations depending on angle of incidence of radiations with respect to surface of optical unit 未知

公开(公告)号：DE102006013459A1

公开(公告)日：2007-09-27

申请号：DE102006013459

申请日：2006-03-23

Applicant: INFINEON TECHNOLOGIES AG

Inventor： PFORR RAINER , TSCHISCHGALE JOERG , KUECHLER BERND , MUELDERS THOMAS

IPC: G03F7/20

Abstract: The arrangement has a lighting device (4) for producing radiations (1000), and a photo-mask (2) with a set of structural units (3), where the radiations transmit the structural units to a photo-resist (21) arranged on a substrate (5). An optical unit (6) has a surface (7), and causes a local variation of transmission rate of the radiations depending on an angle of incidence of the radiations with respect to the surface. The optical unit is arranged between the photo-mask and the substrate. An independent claim is also included for a method for transmitting structural units to a substrate.

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