公开(公告)号：WO0193331A3

公开(公告)日：2002-07-18

申请号：PCT/US0115998

申请日：2001-05-18

Applicant: INFINEON TECHNOLOGIES CORP ,  IBM

Inventor： KOTHANDARAMAN CHANDRASEKHARAN ,  GRELLNER FRANK ,  IYER SUNDAR UMAR

IPC: H01L21/82 ,  H01L23/525

CPC classification number: H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Described herein is a fuse incorporating a covering layer disposed on a conductive layer, which is disposed on a polysilicon layer. The covering layer preferably comprises a relatively inert material, such as a nitride etchant barrier. The covering layer preferably has a region of relatively less-inert filler material. Upon programming of the fuse, the conductive layer, which can be a silicide, preferentially degrades in the region underlying the filler material of the covering layer. This preferential degradation results in a predictable "blowing" of the fuse in the fuse region underlying the filler material. Since the "blow" area is predictable, damage to adjacent structures can be minimized or eliminated.

Abstract translation: 这里描述的是一种保险丝，其包括设置在多晶硅层上的导电层上的覆盖层。 覆盖层优选地包括相对惰性的材料，例如氮化物蚀刻剂屏障。 覆盖层优选具有相对较少惰性填料的区域。 在对熔丝进行编程时，可以是硅化物的导电层优选在覆盖层的填充材料下方的区域中降解。 这种优先的劣化导致在填充材料下面的保险丝区域中的可预见的“熔断”熔丝。 由于“打击”区域是可预测的，所以可以最小化或消除对相邻结构的损坏。