公开(公告)号：WO2009076777A4

公开(公告)日：2009-08-13

申请号：PCT/CA2008002265

申请日：2008-12-18

Applicant: INTEGRAN TECHNOLOGIES INC ,  PALUMBO GINO ,  BROOKS IAIN ,  TOMANTSCHGER KLAUS ,  LIN PETER ,  AUST KARL ,  NAGARAJAN NANDAKUMAR ,  GONZALEZ FRANCISCO

Inventor： PALUMBO GINO ,  BROOKS IAIN ,  TOMANTSCHGER KLAUS ,  LIN PETER ,  AUST KARL ,  NAGARAJAN NANDAKUMAR ,  GONZALEZ FRANCISCO

IPC: C25D5/50

CPC classification number: C22F1/08 ,  C21D1/06 ,  C21D9/0068 ,  C25D3/12 ,  C25D3/38 ,  C25D5/50

Abstract: Polycrystalline materials are prepared by electrodeposition of a precursor material that is subsequently heat-treated to induce at least a threefold increase in the grain size of the material to yield a relatively high fraction of 'special' low S grain boundaries and a randomized crystallographic texture. The precursor metallic material has sufficient purity and a fine-grained microstructure (e.g., an average grain size of 4 nm to 5 µm). The resulting metallic material is suited to the fabrication of articles requiring high mechanical or physical isotropy and/or resistance to grain boundary-mediated deformation or degradation mechanisms.

Abstract translation: 多晶材料通过电沉积前体材料来制备，所述前体材料随后经过热处理以引起材料的晶粒尺寸增加至少三倍，以产生相对高比例的'特殊'低S晶界和随机化晶体学结构。 前体金属材料具有足够的纯度和细粒度的微观结构（例如平均粒径为4nm至5μm）。 所得金属材料适合于制造需要高机械或物理各向同性和/或抗晶界边界介导的变形或降解机制的制品。

公开(公告)号：CA2674403C

公开(公告)日：2012-06-05

申请号：CA2674403

申请日：2008-12-18

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： AUST KARL ,  BROOKS IAIN ,  GONZALEZ FRANCISCO ,  LIN PETER ,  PALUMBO GINO ,  TOMANTSCHGER KLAUS ,  NAGARAJAN NANDAKUMAR

IPC: C25D5/50

Abstract: Polycrystalline materials are prepared by electrodeposition of a precursor material that is subsequently heat-treated to induce at least a threefold increase in the grain size of the material to yield a relatively high fraction of 'special' low .SIGMA. grain boundaries and a randomized crystallographic texture. The precursor metallic material has sufficient purity and a fine-grained microstructure (e.g., an average grain size of 4 nm to 5 µm). The resulting metallic material is suited to the fabrication of articles requiring high mechanical or physical isotropy and/or resistance to grain boundary-mediated deformation or degradation mechanisms.

公开(公告)号：CA2674403A1

公开(公告)日：2009-06-25

申请号：CA2674403

申请日：2008-12-18

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： NAGARAJAN NANDAKUMAR ,  AUST KARL ,  TOMANTSCHGER KLAUS ,  BROOKS IAIN ,  LIN PETER ,  PALUMBO GINO ,  GONZALEZ FRANCISCO

IPC: C25D5/50

Abstract: Polycrystalline materials are prepared by electrodeposition of a precurso r material that is subsequently heat-treated to induce at least a threefold increase in the grain size of the material to yield a relatively high fracti on of 'special' low .SIGMA. grain boundaries and a randomized crystallograph ic texture. The precursor metallic material has sufficient purity and a fine -grained microstructure (e.g., an average grain size of 4 nm to 5 µm). The r esulting metallic material is suited to the fabrication of articles requirin g high mechanical or physical isotropy and/or resistance to grain boundary-m ediated deformation or degradation mechanisms.

公开(公告)号：EP2222897A4

公开(公告)日：2012-04-04

申请号：EP08861084

申请日：2008-12-18

Applicant: INTEGRAN TECHNOLOGIES INC

Inventor： PALUMBO GINO ,  BROOKS IAIN ,  TOMANTSCHGER KLAUS ,  LIN PETER ,  AUST KARL ,  NAGARAJAN NANDAKUMAR ,  GONZALEZ FRANCISCO

IPC: C25D5/50

CPC classification number: C22F1/08 ,  C21D1/06 ,  C21D9/0068 ,  C25D3/12 ,  C25D3/38 ,  C25D5/50