公开(公告)号：US11139151B1

公开(公告)日：2021-10-05

申请号：US15922762

申请日：2018-03-15

Applicant: Intel Corporation

Inventor： Patrick Whiting ,  Jeffrey L. Young ,  Ryan Wood ,  Eric Scott ,  David Laube ,  Alex Collins

IPC: H01L21/3065 ,  B08B7/00 ,  H01J37/32

Abstract: A method is disclosed, which comprises estimating a first value of a parameter of a component, prior to a use of the component in a reactor. In an example, the parameter of the component is to change during the use of the component in the reactor. The component may be treated, subsequent to the use of the component in the reactor. A second value of the parameter of the component may be estimated, subsequent to treating the component. The second value may be compared with the first value, where a reuse of the component in the reactor is to occur in response to the second value being within a threshold range of the first value.

公开(公告)号：US11901164B2

公开(公告)日：2024-02-13

申请号：US17493705

申请日：2021-10-04

Applicant: Intel Corporation

Inventor： Patrick Whiting ,  Jeffrey L. Young ,  Ryan Wood ,  Eric Scott ,  David Laube ,  Alex Collins

IPC: H01J37/32 ,  H01L21/3065 ,  B08B7/00

CPC classification number: H01J37/32853 ,  B08B7/0028 ,  H01L21/3065 ,  H01J2237/334

Abstract: A method is disclosed, which comprises estimating a first value of a parameter of a component, prior to a use of the component in a reactor. In an example, the parameter of the component is to change during the use of the component in the reactor. The component may be treated, subsequent to the use of the component in the reactor. A second value of the parameter of the component may be estimated, subsequent to treating the component. The second value may be compared with the first value, where a reuse of the component in the reactor is to occur in response to the second value being within a threshold range of the first value.

公开(公告)号：US11112430B2

公开(公告)日：2021-09-07

申请号：US16366197

申请日：2019-03-27

Applicant: Intel Corporation

Inventor： Anil Kaza ,  Donald E. Edenfeld ,  Todd P. Albertson ,  Patrick Whiting

IPC: G01R3/00 ,  G01R1/073 ,  G01R1/067

Abstract: A probe head may be utilized to test an electronic device. The probe head may include a probe axis extending along a length of the probe head. The probe head may include a probe core including a first metal. The probe core may include a core surface having a first dimension. The first dimension may be perpendicular to the probe axis. The probe core may include a probe tip, for instance extending from the core surface along the probe axis. The probe tip has a second dimension that may be perpendicular to the probe axis. The second dimension may be less than the first dimension of the core surface. The probe head may include a cladding layer that includes a second metal. The cladding layer may be coupled around a perimeter of the probe core. The probe tip may extend beyond the cladding layer.

公开(公告)号：US20220028668A1

公开(公告)日：2022-01-27

申请号：US17493705

申请日：2021-10-04

Applicant: Intel Corporation

Inventor： Patrick Whiting ,  Jeffrey L. Young ,  Ryan Wood ,  Eric Scott ,  David Laube ,  Alex Collins

IPC: H01J37/32 ,  H01L21/3065 ,  B08B7/00

Abstract: A method is disclosed, which comprises estimating a first value of a parameter of a component, prior to a use of the component in a reactor. In an example, the parameter of the component is to change during the use of the component in the reactor. The component may be treated, subsequent to the use of the component in the reactor. A second value of the parameter of the component may be estimated, subsequent to treating the component. The second value may be compared with the first value, where a reuse of the component in the reactor is to occur in response to the second value being within a threshold range of the first value.

公开(公告)号：US20210265137A1

公开(公告)日：2021-08-26

申请号：US17171894

申请日：2021-02-09

Applicant: Intel Corporation

Inventor： Jeffrey Young ,  Patrick Whiting ,  David Laube

IPC: H01J37/32 ,  B08B3/08

Abstract: Following use of a reactive process chamber, a component of the chamber, such as an edge ring that is to surround a workpiece during an etching process, may be refurbished through one or more residue removal operations followed by a surface texturing operation. The texturing operation may entail media blasting with a gaseous media propellant comprising a smaller fraction of O2 than air, such as high purity dry N2. The more inert gaseous media propellant may advantageously control oxygen contamination of a bulk metal, such as aluminum. Reconditioning may further entail a chemical treatment, which thins or completely removes, a surface oxide present after the texturing operation. The conditioned surface may then have a surface composition and texture that is capable of matching the performance of a previously unused chamber component.