公开(公告)号：AT370975T

公开(公告)日：2007-09-15

申请号：AT04756066

申请日：2004-06-25

Applicant: JSR CORP

Inventor： BENOIT DIDIER ,  SAFIR ADAM ,  CHANG HAN-TING ,  CHARMOT DOMINIQUE ,  NISHIMURA ISAO ,  SOYANO AKIMASA ,  OKAMOTO KENJI ,  WANG YONG

IPC: C08F220/18 ,  C08F20/18 ,  C08F220/30 ,  G03F7/039

Abstract: The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

公开(公告)号：DE602004008468T2

公开(公告)日：2008-05-21

申请号：DE602004008468

申请日：2004-06-25

Applicant: JSR CORP

Inventor： BENOIT DIDIER ,  SAFIR ADAM ,  CHANG HAN-TING ,  CHARMOT DOMINIQUE ,  NISHIMURA ISAO ,  SOYANO AKIMASA ,  OKAMOTO KENJI ,  WANG YONG

IPC: C08F220/18 ,  C08F20/18 ,  C08F220/30 ,  G03F7/039

Abstract: The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

公开(公告)号：DE602004008468D1

公开(公告)日：2007-10-04

申请号：DE602004008468

申请日：2004-06-25

Applicant: JSR CORP

Inventor： BENOIT DIDIER ,  SAFIR ADAM ,  CHANG HAN-TING ,  CHARMOT DOMINIQUE ,  NISHIMURA ISAO ,  SOYANO AKIMASA ,  OKAMOTO KENJI ,  WANG YONG

IPC: C08F220/18 ,  C08F20/18 ,  C08F220/30 ,  G03F7/039

Abstract: The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.