公开(公告)号：AT370975T

公开(公告)日：2007-09-15

申请号：AT04756066

申请日：2004-06-25

Applicant: JSR CORP

Inventor： BENOIT DIDIER ,  SAFIR ADAM ,  CHANG HAN-TING ,  CHARMOT DOMINIQUE ,  NISHIMURA ISAO ,  SOYANO AKIMASA ,  OKAMOTO KENJI ,  WANG YONG

IPC: C08F220/18 ,  C08F20/18 ,  C08F220/30 ,  G03F7/039

Abstract: The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

公开(公告)号：DE602004008468T2

公开(公告)日：2008-05-21

申请号：DE602004008468

申请日：2004-06-25

Applicant: JSR CORP

Inventor： BENOIT DIDIER ,  SAFIR ADAM ,  CHANG HAN-TING ,  CHARMOT DOMINIQUE ,  NISHIMURA ISAO ,  SOYANO AKIMASA ,  OKAMOTO KENJI ,  WANG YONG

IPC: C08F220/18 ,  C08F20/18 ,  C08F220/30 ,  G03F7/039

Abstract: The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

公开(公告)号：DE602004008468D1

公开(公告)日：2007-10-04

申请号：DE602004008468

申请日：2004-06-25

Applicant: JSR CORP

Inventor： BENOIT DIDIER ,  SAFIR ADAM ,  CHANG HAN-TING ,  CHARMOT DOMINIQUE ,  NISHIMURA ISAO ,  SOYANO AKIMASA ,  OKAMOTO KENJI ,  WANG YONG

IPC: C08F220/18 ,  C08F20/18 ,  C08F220/30 ,  G03F7/039

Abstract: The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

公开(公告)号：JP2011215429A

公开(公告)日：2011-10-27

申请号：JP2010084494

申请日：2010-03-31

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SOYANO AKIMASA ,  TOMIOKA HIROSHI ,  SERIZAWA RYUICHI ,  OIZUMI YOSHIJI

IPC: G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition nearly free from development defect and to provide a polymer used therefor.SOLUTION: The radiation sensitive resin composition contains a polymer (A)having a carbonyl group on at least one terminal of a molecular chain, having weight average molecular weight in terms of polystyrene by gel permeation chromatography of ≥11,000 and decomposed by action of an acid and increasing solubility in an alkali developer and a radiation-sensitive acid generator (B).

Abstract translation: 要解决的问题：提供几乎不含显影缺陷的辐射敏感性树脂组合物，并提供用于其的聚合物。解决方案：辐射敏感性树脂组合物含有在分子的至少一个末端具有羰基的聚合物（A） 链，通过凝胶渗透色谱法测定聚苯乙烯的重均分子量≥11,000，并通过酸的作用分解并增加在碱性显影剂和辐射敏感性酸产生剂（B）中的溶解度。

公开(公告)号：JP2010066489A

公开(公告)日：2010-03-25

申请号：JP2008232436

申请日：2008-09-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SOYANO AKIMASA ,  FUJIWARA KOICHI ,  WAKAMATSU TAKASHI ,  HORI MASASHI

IPC: G03F7/039 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition of which a first resist pattern is insolubilized to form an insolubilized resist pattern having sufficient stability to subsequent exposure, a developer and a second positive radiation-sensitive resin composition. SOLUTION: The positive radiation-sensitive resin composition contains a resin containing 5-65 mol% of a specific repeating unit and having an acid-dissociable group, and is used in step (1) of a resist pattern forming method including the steps of: (1) forming a first resist pattern; (2) applying a resist pattern insolubilizing resin composition on the first resist pattern to convert the first resist pattern to an insolubilized resist pattern; (3) forming a second resist layer on the insolubilized resist pattern and selectively exposing it; and (4) forming a second resist pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种正性辐射敏感性树脂组合物，其中第一抗蚀剂图案不溶解以形成对随后暴露的足够稳定性的不溶性抗蚀剂图案，显影剂和第二正性辐射敏感性树脂组合物。 阳离子敏感性树脂组合物含有含有5-65mol％的特定重复单元并具有酸解离基团的树脂，并且用于抗蚀剂图案形成方法的步骤（1）中，该抗蚀剂图案形成方法包括 步骤：（1）形成第一抗蚀剂图案; （2）在第一抗蚀剂图案上涂布抗蚀剂图案不溶化树脂组合物以将第一抗蚀剂图案转化为不溶化抗蚀剂图案; （3）在不溶解的抗蚀剂图案上形成第二抗蚀剂层并选择性地使其曝光; 和（4）形成第二抗蚀剂图案。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2005128049A

公开(公告)日：2005-05-19

申请号：JP2003360291

申请日：2003-10-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  KOBAYASHI HIDEKAZU ,  SOYANO AKIMASA ,  O ISAMU

IPC: G03F7/039 ,  C08F4/72 ,  C08F20/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a radiation, excellent basic properties as a resist such as sensitivity, resolution, dry etching resistance and pattern shape, particularly excellent solubility in a resist solvent, and reducing the roughness of a side wall of a pattern after development. SOLUTION: The radiation-sensitive resin composition contains: an acid-dissociating group-containing resin which is alkali-insoluble or slightly alkali-soluble but becomes readily alkali-soluble by the action of an acid; and a radiation-sensitive acid generator. The acid-dissociating group-containing resin is obtained by polymerizing (i) a compound represented by formula (1) or (ii) a mixture of a compound represented by the formula (1) and one or more compounds selected from a radical polymerization initiator and a ditelluride compound represented by formula (2). COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供对辐射具有高透明度的辐射敏感性树脂组合物，作为抗蚀剂的优异的基本性能如灵敏度，分辨率，耐干蚀刻性和图案形状，在抗蚀剂溶剂中特别优异的溶解度， 并且在显影后降低图案的侧壁的粗糙度。 解决方案：辐射敏感性树脂组合物包含：碱解不溶性或略微碱溶性的酸解离基团的树脂，其通过酸的作用容易碱溶; 和辐射敏感的酸发生器。 含酸解离基的树脂通过以下方式获得：（i）由式（1）表示的化合物或（ii）由式（1）表示的化合物与一种或多种选自自由基聚合引发剂的化合物的混合物 和由式（2）表示的二碲化合物。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2003322971A

公开(公告)日：2003-11-14

申请号：JP2002127446

申请日：2002-04-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SOYANO AKIMASA ,  KATAOKA ATSUKO ,  KUROKAWA MITSUO

IPC: G03F7/039 ,  C08F20/18 ,  C08F32/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition as a chemically amplifying resist which is sensitive to active radiation, for example, far UV rays represented by KrF excimer laser or ArF excimer laser and which can form a resist pattern with excellent uniformity in film thickness, excellent adhesion property with a substrate, accuracy, sensitivity, resolution and so on.
SOLUTION: The radiation sensitive resin composition contains: (A) an alkali insoluble or alkali hardly soluble resin containing an acid-dissociable group which changes into alkali soluble when the acid dissociable group is dissociated; (B) a radiation sensitive acid producing agent; and (C) a compound expressed by general formula (1) as a solvent.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种对活性辐射敏感的化学放大抗蚀剂的辐射敏感性树脂组合物，例如由KrF准分子激光或ArF准分子激光器表示的远紫外线，并且可以形成具有 优异的膜厚均匀性，与基材的附着性优异，精度高，灵敏度高，分辨率高等特点。 解决方案：辐射敏感性树脂组合物包含：（A）当酸解离基解离时，含有可溶解酸碱解的基团的碱不溶性或碱难溶性树脂变为碱溶性; （B）辐射敏感性产酸剂; 和（C）由通式（1）表示的化合物作为溶剂。 版权所有（C）2004，JPO

公开(公告)号：JP2014191121A

公开(公告)日：2014-10-06

申请号：JP2013065259

申请日：2013-03-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ASANO YUSUKE ,  SOYANO AKIMASA

IPC: G03F7/004 ,  C07D327/04 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an acid diffusion controlling agent with which a photoresist composition excellent in LWR (line width roughness) performance, EL (exposure latitude) performance and pattern features can be prepared.SOLUTION: The acid diffusion controlling agent comprises a nitrogen-containing compound which includes a group having -SO- or -SO- in a carbon-carbon bond of a monovalent hydrocarbon group having 2 to 30 carbon atoms. The nitrogen-containing compound is preferably a compound expressed by formula (1) shown below. In formula (1), Rand Rrepresent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and Rand Rmay be bonded to each other together with a nitrogen atom bonded thereto to form a ring structure; X represents a single bond, a carbonyl group, an ether group, an imino group, a divalent hydrocarbon group having 1 to 20 carbon atoms, or a group composed of a combination of these groups; Y represents a group having -SO- or -SO- in a carbon-carbon bond of a monovalent hydrocarbon group having 2 to 30 carbon atoms, and a part of or the entire hydrogen atoms in the group represented by Y may be substituted.

Abstract translation: 要解决的问题：提供一种酸性扩散控制剂，可以制备LWR（线宽粗糙度）性能优异的光致抗蚀剂组合物，EL（曝光自由度）性能和图案特征。解决方案：酸扩散控制剂包括氮 含有碳原子数为2〜30的一价烃基的碳 - 碳中具有-SO-或-SO-的基团的化合物。 含氮化合物优选为下述式（1）表示的化合物。 在式（1）中，兰德R表示氢原子或碳原子数1〜20的一价有机基团，兰德Rmay与键合有氮原子的基团结合形成环结构。 X表示单键，羰基，醚基，亚氨基，碳原子数1〜20的二价烃基或由这些基的组合构成的基团。 Y表示具有2〜30个碳原子的一价烃基的碳 - 碳键中具有-SO-或-SO-的基团，并且由Y表示的基团中的一部分或全部氢原子可以被取代。

公开(公告)号：JP2011059516A

公开(公告)日：2011-03-24

申请号：JP2009210752

申请日：2009-09-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OIZUMI YOSHIJI ,  OTSUKA NOBORU ,  SOYANO AKIMASA

IPC: G03F7/039 ,  C08F220/18 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition as a material for a resist film with which a resist pattern having a small LWR (line width roughness) and a wide DOF (depth of focus) can be formed. SOLUTION: The radiation-sensitive resin composition contains a polymer (A) having a repeating unit expressed by formula (1) by not less than 40 mol%, and an acid generator (B). In formula (1), R 1 represents a hydrogen atom or the like; R 2 represents an alkyl group; R 3 represents a carbon atom; and Z represents an alicyclic skeleton. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种作为抗蚀剂膜的材料的辐射敏感性树脂组合物，可以形成具有小LWR（线宽粗糙度）和宽DOF（深度聚焦）的抗蚀剂图案。 解决方案：辐射敏感性树脂组合物含有由式（1）表示的重复单元不低于40mol％的聚合物（A）和酸产生剂（B）。 在式（1）中，R“1”表示氢原子等; R 2 表示烷基; R 3 表示碳原子; Z表示脂环骨架。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010250279A

公开(公告)日：2010-11-04

申请号：JP2010017785

申请日：2010-01-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OIZUMI YOSHIJI ,  OTSUKA NOBORU ,  SOYANO AKIMASA ,  SERIZAWA RYUICHI ,  TOMIOKA HIROSHI

IPC: G03F7/039 ,  C07C19/07 ,  C07C309/06 ,  C07C309/12 ,  C07C381/12 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition, which is free from problems of a radiation-sensitive acid generator, having a perfluoroalkyl sulfonyl structure such as PFOS (perfluoro-n-octane sulfonic acid), which has characteristics of excellent resolution performance, no vaporization of an acid generated by exposure, and an appropriately short diffusion length, and which gives a small LWR (line width roughness) as an index of fluctuation in the line width of a resist pattern, and can give a resist pattern having a small film reduction. SOLUTION: The radiation-sensitive resin composition comprises (A) a radiation-sensitive acid generator, having a partial fluoroalkyl structure and (B) a resin having a specified cyclic carbonate structure. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有全氟烷基磺酰结构如PFOS（全氟正辛烷磺酸）的辐射敏感性酸产生剂的问题的辐射敏感性树脂组合物，其具有 具有优异的分辨率性能，曝光产生的酸不蒸发，扩散长度短的优点，作为抗蚀剂图案的线宽度的波动指数，LWR（线宽粗糙度）小，能够得到 具有小的膜还原的抗蚀剂图案。 解决方案：辐射敏感性树脂组合物包含（A）具有部分氟烷基结构的辐射敏感性酸产生剂和（B）具有特定环状碳酸酯结构的树脂。 版权所有（C）2011，JPO＆INPIT