公开(公告)号：EP2562178A4

公开(公告)日：2013-08-14

申请号：EP11765573

申请日：2011-03-29

Applicant: JSR CORP

Inventor： TAMORI KOUJI ,  ABE TAKAYOSHI ,  OKANO YUSUKE ,  MOMIYAMA MASAKI ,  KAWAI HIROSHI ,  HYUGAJI SATOSHI ,  WANG YONG

IPC: C07K1/22 ,  B01D15/38 ,  B01J20/286 ,  C07K1/18 ,  C07K16/00 ,  C08F8/00 ,  C08F20/20 ,  C08F20/32 ,  C08F222/10

CPC classification number: C07K1/18 ,  B01D15/3804 ,  B01D15/3809 ,  B01J20/286 ,  C07K1/22 ,  C08F222/1006 ,  C08F220/20 ,  C08F2220/325 ,  C08F2220/281 ,  C08F220/58

公开(公告)号：EP1600437A4

公开(公告)日：2006-07-26

申请号：EP04713184

申请日：2004-02-20

Applicant: JSR CORP

Inventor： EBATA SATOSHI ,  WANG YONG ,  NISHIMURA ISAO

IPC: C07C309/17 ,  C07C309/19 ,  C07C309/23 ,  C07C381/12 ,  C07D207/46 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  C08K5/41 ,  C08L101/12

CPC classification number: C07C309/19 ,  C07C309/17 ,  C07C309/23 ,  C07C381/12 ,  C07C2602/42 ,  C07C2603/86 ,  C07D207/46 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

Abstract: The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R to R are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

Abstract translation: 本发明提供了新颖的酸产生剂，其在人体内的燃烧性和积聚性方面是无问题的，并且可产生具有高酸度和高沸点的酸，并且在抗蚀剂涂膜中表现出适当短的扩散长度，并且允许形成具有优异光滑性的抗蚀剂图案 依赖于掩模图案的密度; 酸产生器产生的磺酸; 用于合成酸发生剂的原料的磺酰卤; 和含有酸发生剂的辐射敏感性树脂组合物。 酸产生剂具有由通式（I）表示的结构，其中R 1是烷氧基羰基，烷基磺酰基或烷氧基磺酰基等一价取代基; R 2至R 4各自为氢或烷基; k为0以上的整数; 并且n为0〜5的整数。在这些辐射敏感性树脂组合物中，除了上述酸产生剂之外，阳性物质含有具有酸解离基团的树脂，负极材料含有碱溶性树脂和交联 除酸产生剂外还可加入。

公开(公告)号：EP1953595A4

公开(公告)日：2011-03-30

申请号：EP06823478

申请日：2006-11-20

Applicant: JSR CORP

Inventor： NAKAMURA ATSUSHI ,  WANG YONG ,  TSUJI TAKAYUKI

IPC: G03F7/039 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/0397

公开(公告)号：EP1602975A4

公开(公告)日：2009-12-02

申请号：EP03789633

申请日：2003-12-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  FUJIWARA KOUICHI ,  KOBAYASHI EIICHI ,  SHIMOKAWA TSUTOMU ,  NAKAMURA ATSUSHI ,  YONEDA EIJI ,  WANG YONG

IPC: C08F4/00 ,  G03F7/004 ,  G03F7/039

CPC classification number: G03F7/039 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2006

公开(公告)号：EP1586570A4

公开(公告)日：2007-06-20

申请号：EP04701104

申请日：2004-01-09

Applicant: JSR CORP

Inventor： MIYAMATSU TAKASHI ,  NIWATA HIROKAZU ,  EBATA SATOSHI ,  WANG YONG

IPC: C07D333/46 ,  C07D333/72 ,  C07D333/78 ,  G03F7/004 ,  G03F7/039 ,  C08L33/06

CPC classification number: C07D333/72 ,  C07D333/46 ,  C07D333/78 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/123

Abstract: Sulfonium salts which are excellent in transparency to rays having wavelengths of 220nm or below and can attain excellent performances in sensitivity, resolution, pattern shape, LER, storage stability, and so on when used as radiation-sensitive acid generator; and positive radiation-sensitive resin compositions containing the salts as the radiation-sensitive acid generator. The sulfonium salts are represented by the general formula (I): (I) [wherein R1 is halogeno, alkyl, alicyclic hydrocarbyl, alkoxyl, -OR3 (wherein R3 is alicyclic hydrocarbyl), or the like; R2 is (substituted) alkyl, or two or more R2s are united to form a ring structure; p is 0 to 7; q is 0 to 6; n is 0 to 3; and X- is a sulfonate anion]. The positive radiation-sensitive resin compositions comprise (A) radiation-sensitive acid generators consisting of the sulfonium salts and (B) resins having acid-dissociable groups.

公开(公告)号：EP2339339A4

公开(公告)日：2016-10-12

申请号：EP09816172

申请日：2009-09-24

Applicant: JSR CORP

Inventor： TAMORI KOUJI ,  FUKUTA TETSUO ,  MIYAJI MASAAKI ,  WANG YONG ,  ABE TAKAYOSHI ,  OKANO YUUSUKE ,  MOMIYAMA MASAKI ,  KAWAI TAKAHIRO

IPC: G01N30/88 ,  B01J20/286 ,  C07K1/22 ,  C07K14/31

CPC classification number: C07K1/22 ,  B01J20/286 ,  B01J20/321 ,  B01J20/3219 ,  B01J20/3274 ,  Y10T428/29

Abstract: An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles.

公开(公告)号：EP2574631A4

公开(公告)日：2013-12-04

申请号：EP11759404

申请日：2011-03-23

Applicant: JSR CORP

Inventor： TAMORI KOUJI ,  FUKUTA TETSUO ,  MIYAJI MASAAKI ,  WANG YONG ,  ABE TAKAYOSHI ,  OKANO YUSUKE ,  MOMIYAMA MASAKI ,  KAWAI TAKAHIRO

IPC: C07K17/08 ,  B01J20/32 ,  C07K1/22 ,  C07K19/00 ,  C12N15/09 ,  G01N30/88

CPC classification number: C07K1/22 ,  B01D15/3804 ,  B01J20/286 ,  B01J20/288 ,  B01J20/3219 ,  B01J20/3274 ,  C07K2317/10

Abstract: Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier. €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒR-R 2 €ƒ€ƒ€ƒ€ƒ€ƒ(1) wherein R represents an amino acid sequence consisting of 4 to 300 amino acid residues containing a region consisting of 4 to 20 contiguous histidine residues; and R 2 represents an amino acid sequence capable of binding to immunoglobulin, the amino acid sequence consisting of 50 to 500 amino acid residues containing Z domain of Protein A or a fragment thereof, or a variant thereof, provided that the R binds to C-terminus or N-terminus of the R 2 .

公开(公告)号：EP1748469A4

公开(公告)日：2012-04-04

申请号：EP05741390

申请日：2005-05-19

Applicant: JSR CORP

Inventor： MIYAMATSU TAKASHI ,  NEMOTO HIROAKI ,  WANG YONG

IPC: H01L21/027 ,  G03F7/20 ,  G03F7/38

CPC classification number: G03F7/2041

公开(公告)号：EP1843387A4

公开(公告)日：2010-01-13

申请号：EP06712065

申请日：2006-01-20

Applicant: JSR CORP

Inventor： FURUKAWA TAIICHI ,  HIEDA KATSUHIKO ,  MIYAMATSU TAKASHI ,  WANG YONG ,  YAMADA KINJI

IPC: H01L21/027 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/70341

公开(公告)号：EP1231205A4

公开(公告)日：2004-05-26

申请号：EP00974921

申请日：2000-11-10

Applicant: JSR CORP

Inventor： WANG YONG ,  MUTSUGA YASUAKI ,  SHIMIZU SHIGEO ,  SHIMOKAWA TSUTOMU ,  KUMANO ATSUSHI

IPC: C07C67/343 ,  C07C69/618 ,  C07D309/12 ,  C08F30/02 ,  G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0397 ,  C07C67/343 ,  C07C69/618 ,  C07D309/12 ,  C08F30/02 ,  G03F7/0045 ,  G03F7/039

Abstract: Vinylphenylpropionic acid derivatives; processes for producing the derivatives; polymers of the same; and radiosensitive resin compositions containing the polymers. The above polymers exhibit low radiation absorption and are useful as the resin component of radiosensitive resin compositions particularly suitable for chemically amplified resists. For example, t-butyl 4-vinylphenylpropionate is produced by (1) reacting t-butyl bromoacetate with tri(n-butyl)phosphine to obtain a quaternary phosphonium salt, (2) reacting this salt with a base to obtain a phosphorus ylide, (3) reacting this ylide with 2,4,6-tris(3',5'-di-t-butyl-4'-hydroxybenzyl)methyl-styrene to obtain a quaternary phosphonium salt, and (4) hydrolyzing this salt.