公开(公告)号：EP3026010A4

公开(公告)日：2017-04-12

申请号：EP14829914

申请日：2014-07-18

Applicant: JSR CORP

Inventor： HIEDA KATSUHIKO ,  INOMATA KATSUMI ,  MIYAZAKI TOMOKAZU ,  DOI TAKASHI ,  KUBO HIROTO

IPC: B81C3/00 ,  B01J19/00 ,  B01L3/00 ,  B29D24/00 ,  B81B1/00 ,  B81C1/00 ,  G01N37/00 ,  G03F7/038

CPC classification number: B01L3/5027 ,  B01J19/00 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00828 ,  B01J2219/00833 ,  B01J2219/00853 ,  B01J2219/00873 ,  B01L3/502707 ,  B01L2200/12 ,  B01L2300/04 ,  B01L2300/0816 ,  B01L2300/0887 ,  B01L2300/12 ,  B01L2300/123 ,  B01L2300/16 ,  B29D24/00 ,  B81B2201/058 ,  B81C1/00119 ,  G03F7/038 ,  G03F7/40

公开(公告)号：EP3040411A4

公开(公告)日：2017-04-19

申请号：EP14839338

申请日：2014-08-06

Applicant: JSR CORP

Inventor： HIEDA KATSUHIKO ,  SHIMOKAWA TSUTOMU ,  KUBO HIROTO ,  DOI TAKASHI

IPC: C12N1/02 ,  C08J5/18 ,  C08K5/23 ,  C08K5/28 ,  C12M1/26 ,  C12N5/07 ,  C12N5/071 ,  C12N5/10 ,  G01N1/04

CPC classification number: C12N1/02 ,  C08J5/18 ,  C08J2333/02 ,  C08K5/235 ,  C08K5/28 ,  C12M23/20 ,  C12M25/06 ,  C12M33/00 ,  C12N5/0625

Abstract: An object of the invention is to provide an adherend recovery method capable of recovering adherends such as cells no matter the types of adherends. [Solution] An adherend recovery method for recovering an adherend from a support includes exposing a stack disposed on the support, the stack including a photosensitive gas generation layer, an adhesive layer and the adherend in this order on the support, generating a gas from the photosensitive gas generation layer by the exposure to separate the support and the stack from each other by the action of the gas, and recovering the adherend from the support by recovering the stack separated.

Abstract translation: 本发明的目的在于提供一种能够回收被粘附物例如细胞的被粘物回收方法，不管被粘物的种类如何。 [解决方案]用于从支撑体回收被粘物的被粘物恢复方法包括：将布置在载体上的堆叠，包括感光气体产生层，粘合剂层和被粘物的叠层暴露在载体上，从而从载体上产生气体 感光气体发生层通过暴露于气体的作用使支撑体和叠层彼此分离，并且通过回收分离的层叠来从支撑体回收被粘物。

公开(公告)号：JP2013068681A

公开(公告)日：2013-04-18

申请号：JP2011205370

申请日：2011-09-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MAKIUCHI NAOMASA ,  DOI TAKASHI ,  ENDO TAKESHI

IPC: G03F7/004 ,  C08G59/68 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a curable composition and a cured film excellent in preservation stability.SOLUTION: There is provided a curable composition containing a compound [A] represented by the following formula (1) and a compound [B] having an epoxy group. The compound [A] is preferably represented by the following formula (2). In addition, Rin the formula (2) is an oxygen atom, Ris a nitro group, m is 1 or Ris a sulfur atom and m is preferably 0. Further, the compound [B] having an epoxy group is preferably a polymer having a structural unit derived from at least one compound selected from the group consisting of (b1) an unsaturated carboxylic acid and an unsaturated carboxylic anhydride and a structural unit derived from (b2) an epoxy group-containing unsaturated compound.

Abstract translation: 要解决的问题：提供保存稳定性优异的固化性组合物和固化膜。 解决方案：提供含有由下式（1）表示的化合物[A]和具有环氧基的化合物[B]的可固化组合物。 化合物[A]优选由下式（2）表示。 另外，式（2）中的R 3 是氧原子，R“是硝基，m是1 或R 3 是硫原子，m优选为0.此外，具有环氧基的化合物[B]优选为具有衍生自至少一种化合物的结构单元的聚合物 选自（b1）不饱和羧酸和不饱和羧酸酐和衍生自（b2）含环氧基的不饱和化合物的结构单元。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011190241A

公开(公告)日：2011-09-29

申请号：JP2011021233

申请日：2011-02-02

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： DOI TAKASHI ,  YONEDA EIJI ,  ABE SHIGERU ,  TAKASE HIDEAKI ,  ENDO TAKESHI

IPC: C07C271/24 ,  C07D213/75 ,  G03F7/004 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a compound having high radiation-sensitivity when used as a photopolymerization initiator, and to provide a radiation-sensitive composition which gives a cured film having high radiation-sensitivity and excellent solvent resistance. SOLUTION: The composition is represented by formula (1), wherein R 1 , R 2 , R 3 , and R 4 each independently represent a hydrogen atom, a halogen atom, a cyano group or a nitro group. R 5 represents a cyano group or a phenyl group in which some or all of hydrogen atoms are substituted with 1-12C alkoxy groups. R 6 and R 7 each independently represent a hydrogen atom, a 1-6C alkyl group, a cyclopentyl group, a cyclohexyl group or a nitrogen-containing heterocyclic group. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供当用作光聚合引发剂时具有高辐射敏感性的化合物，并提供具有高辐射敏感性和优异耐溶剂性的固化膜的辐射敏感性组合物。 解决方案：组合物由式（1）表示，其中R 1，R 2，R 2，R 3，SP 3和/或SP > 4 各自独立地表示氢原子，卤素原子，氰基或硝基。 R 5表示其中部分或全部氢原子被1-12个C 1烷氧基取代的氰基或苯基。 R 6和R 7各自独立地表示氢原子，1-6C烷基，环戊基，环己基或含氮杂环基。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2013200431A

公开(公告)日：2013-10-03

申请号：JP2012068435

申请日：2012-03-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MAKIUCHI NAOMASA ,  DOI TAKASHI ,  ENDO TAKESHI

IPC: G03F7/004 ,  C08G59/40 ,  G02B5/20 ,  G02F1/1339 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having both storage stability and low-temperature curability and sufficient pattern forming capability; a cured film being formed using such a radiation-sensitive resin composition and being excellent in demand characteristics such as heat resistance and compression characteristics; and a formation method of such a cured film.SOLUTION: A radiation-sensitive resin composition contains [A] an alkali-soluble resin, [B] a polymerizable compound having an ethylenically unsaturated bond, [C] a radiation-sensitive polymerization initiator and [D] a compound represented by the formula (1), where the [A] alkali-soluble resin has an epoxy group or further contains [E] an epoxy compound.

Abstract translation: 要解决的问题：提供具有储存稳定性和低温固化性和足够的图案形成能力的辐射敏感性树脂组合物; 使用这种辐射敏感性树脂组合物形成的固化膜，并且具有优异的耐热性和压缩特性等需求特性; 以及这种固化膜的形成方法。解决方案：辐射敏感性树脂组合物含有[A]碱溶性树脂，[B]具有烯键式不饱和键的聚合性化合物，[C]辐射敏感聚合引发剂和 [D]式（1）表示的化合物，其中[A]碱溶性树脂具有环氧基，或者还含有环氧化合物[E]。

公开(公告)号：JP2010134422A

公开(公告)日：2010-06-17

申请号：JP2009195974

申请日：2009-08-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KINOSHITA YOSHINORI ,  HANAMURA MASAAKI ,  DOI TAKASHI ,  TAKASE HIDEAKI

IPC: G03F7/023 ,  G02B1/04 ,  G02B3/00 ,  G03F7/004 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity to radiation and having such a development margin that desirable pattern configuration is formed even when the optimum development time is exceeded in the development step.
SOLUTION: The radiation-sensitive resin composition includes [A] an alkali-soluble resin, [B] a 1,2-quinonediazide compound, and [C] a compound having at least one ethylenically unsaturated bond per molecule and having a skeleton derived from trimethylolpropane or pentaerythritol or an isocyanurate skeleton. The alkali-soluble resin [A] may be a copolymer of unsaturated compounds including (a1) an unsaturated carboxylic acid and/or unsaturated carboxylic anhydride and (a2) an epoxy group-containing unsaturated compound.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供对辐射具有高灵敏度的辐射敏感性树脂组合物，并且具有即使在显影步骤中超过最佳显影时间时形成所需图案构型的显影余量。 解决方案：辐射敏感性树脂组合物包括[A]碱溶性树脂，[B] 1,2-醌二叠氮化合物和[C]每分子具有至少一个烯属不饱和键的化合物，并具有 衍生自三羟甲基丙烷或季戊四醇的骨架或异氰脲酸酯骨架。 碱溶性树脂[A]可以是包含（a1）不饱和羧酸和/或不饱和羧酸酐的不饱和化合物和（a2）含环氧基的不饱和化合物的共聚物。 版权所有（C）2010，JPO＆INPIT