Abstract:
A glass paste composition contains: (A) glass powders (B) a binder resin; and (C) at least one organic solvent selected from a ketone, an alcohol and an ester which has property that the normal boiling point is 100 to 200 DEG C, and the vapor pressure at 20 DEG C is 0.5 to 50 mmHg. A plasma display panel is produced by a method which comprises coating the glass paste composition on a base film to form a film forming material layer; transferring the film forming material layer formed on the base film to a glass substrate; and baking the transferred film forming material layer to form a dielectric layer on the surface of the glass substrate.
Abstract:
RADIATION-SENSITIVE COMPOSITION FOR FORMING COLORED LAYER, COLOR FILTER AND COLOR LIQUID CRYSTAL DISPLAY DEVICE A radiation-sensitive composition for forming a colored layer is provided which can be used for forming a color filter free from generation of residue and scumwith high product yield and which can provide a pattern having sufficient surface smoothness. Provided are a radiation-sensitive composition for forming a colored layer, which contains (A) at least one pigment selected from the group consisting of red pigments, green pigments and blue pigments, (B) a dispersant, (C) an alkali-soluble resin, (D) a polyfunctional monomer represented by the following formula (1): where R1, represents a hydrogen atom or a methyl group, and R2 represents an alkylene group etc., (E) a photopolymerization initiator and (F) a solvent, wherein the content of the pigment (A) is 30 to 60 wt% based on a total weight of the composition except (F) the solvent, and a color filter formed of the composition.
Abstract:
A glass paste composition contains: (A) glass powders (B) a binder resin; and (C) at least one organic solvent selected from a ketone, an alcohol and an ester which has property that the normal boiling point is 100 to 200 DEG C, and the vapor pressure at 20 DEG C is 0.5 to 50 mmHg. A plasma display panel is produced by a method which comprises coating the glass paste composition on a base film to form a film forming material layer; transferring the film forming material layer formed on the base film to a glass substrate; and baking the transferred film forming material layer to form a dielectric layer on the surface of the glass substrate.
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition for forming a colored layer, which can obtain a pixel free from water irregularity and can obtain the pixel having sufficient various characteristics and a black matrix, even when eliminating a prebaking process. SOLUTION: The radiation-sensitive composition for forming the colored layer contains (A) a coloring agent, (B) an alkali-soluble resin, (C) a monomer having two or more polymerizable unsaturated bonds, (D) a compound having an oxetanyl group, (E) a radiation-sensitive radical generating agent, and (F) a specified onium fluoroalkylfluorophosphate. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a forming method of a radiation sensitive composition of a color filter and a colored layer of a color filter, which can form a colored layer of an even thickness with a high production yield without making uneven coating often caused by a slit die coater. SOLUTION: The radiation sensitive composition of a color filter contains (A) pigment, (B) alkaline soluble resin, (C) polyfunction monomer, (D) optical radical generator, and (E) solvent. When denoting its viscosity by A (mPa s), its surfacetension by B (mN/m), and the coating speed by V (m/s), the value (AxV/B)is less than 4.0x10 -2 , and it is used when coating by using a slit die coater. The forming method of the colored layer of a color filter uses the above composition, while making the coating speed 0.07 m/s or faster but 0.15 m/s or less. COPYRIGHT: (C)2004,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To obtain a compsn. that can form a pattern having excellent film hardness which can not be damaged even when washed with a brush and which can form pixels with excellent adhesion property with a substrate and light- shielding the layer, by incorporating a coloring agent, a specified alkali-soluble resin, a polyfunctional monomer and a photopolymn. initiator. SOLUTION: The compsn. contains a coloring agent, an alkali soluble resin containing copolymers of monomers expressed by the formula and other monomers copolymerizable with the first monomers, polyfunctional monomers, and photopolymn. initiator. In the formula, R1, R2, R3 are each independently hydrogen atom or a 1-5C alkyl group, R4 is a 1-5C alkyl group, and m and n are independently integers 1 to 5. The use amt. of the alkali soluble resin is preferably 10 to 10,000 pts.wt. to 100 pts.wt. of the coloring agent. Thus, a pattern having excellent film hardness which is hardly damaged by brush washing can be formed, and pixels having excellent adhesion property with a substrate and light-shielding layer can be obtd.
Abstract:
PROBLEM TO BE SOLVED: To prevent undercut in development and to surely produce a pattern of each constituent element with high efficiency and high definition by forming and baking a pattern of an inorg. powder dispersed paste layer corresponding to a resist pattern contg. at least one biimidazole compd. SOLUTION: A resist film contg. at least one biimidazole compd. represented by formula I or II is formed on an inorg. powder dispersed paste layer, exposed and developed to form a resist pattern. A pattern of the paste layer corresponding to the resist pattern is then formed and baked. A panel material with an inorg. pattern is thus obtd. In the formula I, X is H, 1-4C alkyl or the like, A is -COO-R and each of (m) and (n) is an integer of 1-3. In the formula II, X -X may be the same or different and are each H, 1-4C alkyl or the like.
Abstract:
PROBLEM TO BE SOLVED: To prevent undercut in development and to surely produce a pattern of each constituent element with high efficiency and high definition by exposing and developing a resist film contg. a specified compd. to form a resist pattern, forming a pattern of an inorg. powder dispersed paste layer corresponding to the resist pattern and baking the paste pattern. SOLUTION: A resist film contg. a compd. represented by the formula is formed on an inorg. powder dispersed paste layer, exposed to form a latent image of a resist pattern and developed to form an apparent resist pattern. The paste layer is then etched to form a pattern of the paste layer corresponding to the resist pattern and the paste pattern is baked. A panel material with an inorg. pattern is thus obtd. Curing reaction is sufficiently attained by irradiation with a small quantity of energy and development is easily carried out.
Abstract:
PROBLEM TO BE SOLVED: To provide a colorant dispersion which makes it possible to prepare radiation-sensitive composition for colored layer formation which enables formation of pixels with a high contrast ratio and excels also in storage stability.SOLUTION: A colorant dispersion contains, as a dispersant, a block copolymer that has each repeating unit represented by formula (1), formula (2), formula (3) and formula (4), and is composed of a block having repeating units represented by formula (1) and formula (2), and a block having repeating units represented by formula (3) and formula (4).