公开(公告)号：DE602004031718D1

公开(公告)日：2011-04-21

申请号：DE602004031718

申请日：2004-03-25

Applicant: JSR CORP

Inventor： IWANAGA SHIN-ICHIRO ,  KIMURA TOORU ,  NISHIKAWA KOUJI

IPC: G03F7/033 ,  C08L33/04 ,  C09D133/04 ,  G03F7/004 ,  G03F7/028 ,  G03F7/029 ,  G03F7/031

公开(公告)号：AU2002367625A1

公开(公告)日：2003-09-04

申请号：AU2002367625

申请日：2002-12-13

Applicant: JSR CORP

Inventor： IWANAGA SHIN-ICHIRO ,  IWAMOTO SATOSHI ,  KIMURA TOORU ,  NISHIMURA HIROKO ,  NISHIKAWA KOJI

IPC: G03F7/027 ,  C08F290/12 ,  G03F7/004 ,  G03F7/033 ,  G03F7/40 ,  H01L21/027 ,  H05K3/00 ,  H01L21/288

Abstract: A radiation-sensitive resin composition comprising (A) an alkali-soluble resin having an unsaturated group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a radiation-induced radical polymerization initiator, wherein: the alkali-soluble resin having an unsaturated group (A) is obtained by reacting: 100 parts by weight of a copolymer comprising 1 to 40 wt% structural units derived from (a) a radically polymerizable compound having a carboxyl group; 1 to 50 wt% structural units having a phenolic hydroxyl group which are derived from (b-1) a radically polymerizable compound having a phenolic hydroxyl group or (b-2) a radically polymerizable compound having a functional group convertible into a phenolic hydroxyl group after the copolymerization, other structural units of said copolymer being derived from (c) another radically polymerizable compound; with 0.1 to 20 parts by weight of (d) a radically polymerizable compound having an epoxy group. The resin composition can form a radiation-sensitive film in a thickness greater than a deposit thickness and has a high resolution.

公开(公告)号：EP1746461A4

公开(公告)日：2011-02-02

申请号：EP05726999

申请日：2005-03-24

Applicant: JSR CORP

Inventor： NISHIKAWA KOUJI ,  KIMURA TOORU ,  IWANAGA SHIN-ICHIRO

IPC: G03F7/033 ,  C08F20/18 ,  C08F20/58 ,  G03F7/004 ,  G03F7/40 ,  H01L21/027

CPC classification number: G03F7/40 ,  G03F7/033 ,  Y10S430/107 ,  Y10S430/111 ,  Y10S430/117 ,  Y10S430/119 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/126

公开(公告)号：EP1610177A4

公开(公告)日：2010-07-07

申请号：EP04723323

申请日：2004-03-25

Applicant: JSR CORP

Inventor： IWANAGA SHIN-ICHIRO ,  KIMURA TOORU ,  NISHIKAWA KOUJI

IPC: C08L33/04 ,  G03F7/004 ,  G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  C09D133/04

CPC classification number: G03F7/031 ,  C08L33/04 ,  G03F7/029 ,  G03F7/033 ,  Y10S430/111 ,  Y10S430/121 ,  Y10S430/124 ,  C08L2666/02

公开(公告)号：EP1477848A4

公开(公告)日：2008-01-02

申请号：EP02790753

申请日：2002-12-13

Applicant: JSR CORP

Inventor： IWANAGA SHIN-ICHIRO ,  IWAMOTO SATOSHI ,  KIMURA TOORU ,  NISHIMURA HIROKO ,  NISHIKAWA KOJI

IPC: G03F7/027 ,  C08F290/12 ,  G03F7/004 ,  G03F7/033 ,  G03F7/40 ,  H01L21/027 ,  H01L21/288 ,  H05K3/00

CPC classification number: G03F7/033 ,  G03F7/405

Abstract: A radiation-sensitive resin composition comprising (A) an alkali-soluble resin having unsaturated groups which is obtained by reacting 100 parts by weight of a copolymer comprising 1 to 40 wt% of constituent units derived from a radical -polymerizable compound (a) having a carboxyl group, 1 to 50 wt% of constituent units having phenolic hydroxyl groups which are derived from a radical-polymerizable compound (b-1) having a phenolic hydroxyl group or a radical-polymerizable compound (b-2) having a functional group which can be converted into phenolic hydroxyl after the formation of the copolymer, and the balance of constituent units derived from other radical -polymerizable compound (c) with 0.1 to 20 parts by weight of a radical-polymerizable compound (d) having an epoxy group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a polymerization initiator for radiation- initiated radical polymerization. The composition is characterized by forming a radiation-sensitive resin coating film having a thickness larger than the height of a deposit and high resolution.