公开(公告)号：AT556358T

公开(公告)日：2012-05-15

申请号：AT06822224

申请日：2006-10-25

Applicant: JSR CORP

Inventor： NAKAMURA ATSUSHI ,  NAKAGAWA HIROKI ,  NAKASHIMA HIROMITSU ,  TSUJI TAKAYUKI ,  DOUGAUCHI HIROSHI ,  KOUNO DAITA ,  NISHIMURA YUKIO

IPC: G03F7/20 ,  G03F7/11

公开(公告)号：AT540336T

公开(公告)日：2012-01-15

申请号：AT07829596

申请日：2007-10-11

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  SUGIE NORIHIKO ,  NAKASHIMA HIROMITSU ,  NATSUME NORIHIRO ,  KOUNO DAITA

IPC: G03F7/11 ,  H01L21/027

Abstract: A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises a resin (A) having a repeating unit represented by the following general formula (1-1) and not having a repeating unit represented by the following general formula (1-2), and a resin (B) having a repeating unit represented by the following general formula (1-2) and not having a repeating unit represented by the following general formula (1-1). [In the general formulas (1-1) and (1-2), R 1 is hydrogen or the like; R 2 is single bonds or the like; and R 3 is a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently high receded contact angle.

公开(公告)号：EP1950610A4

公开(公告)日：2010-08-04

申请号：EP06822224

申请日：2006-10-25

Applicant: JSR CORP

Inventor： NAKAMURA ATSUSHI ,  NAKAGAWA HIROKI ,  NAKASHIMA HIROMITSU ,  TSUJI TAKAYUKI ,  DOUGAUCHI HIROSHI ,  KOUNO DAITA ,  NISHIMURA YUKIO

IPC: G03F7/11 ,  C08F216/02 ,  C08F220/02 ,  C08F226/02 ,  C08F228/02 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/11 ,  C08F220/18 ,  C08F220/30 ,  G03F7/0046 ,  G03F7/2041

公开(公告)号：EP2078983A4

公开(公告)日：2010-08-25

申请号：EP07829596

申请日：2007-10-11

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  SUGIE NORIHIKO ,  NAKASHIMA HIROMITSU ,  NATSUME NORIHIRO ,  KOUNO DAITA

IPC: G03F7/11 ,  H01L21/027

CPC classification number: G03F7/11 ,  G03F7/2041