公开(公告)号：DE60102028T2

公开(公告)日：2004-06-24

申请号：DE60102028

申请日：2001-04-05

Applicant: JSR CORP

Inventor： IWASAWA HARUO ,  SHIMOKAWA TSUTOMU ,  AKIHIRO HAYASHI ,  NISHIYAMA SATORU

IPC: C08G77/42 ,  C07F7/08 ,  C08G77/14 ,  C08G77/24 ,  C08L83/06 ,  C08L83/08 ,  G03F7/004 ,  G03F7/075 ,  C08G77/04 ,  C08L83/04 ,  C08L83/14 ,  C07F7/04 ,  C07F7/21 ,  G03F7/039

Abstract: A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A and A are an acid-dissociable monovalent organic group, R is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

公开(公告)号：DE60102028D1

公开(公告)日：2004-03-25

申请号：DE60102028

申请日：2001-04-05

Applicant: JSR CORP

Inventor： IWASAWA HARUO ,  SHIMOKAWA TSUTOMU ,  AKIHIRO HAYASHI ,  NISHIYAMA SATORU

IPC: C08G77/42 ,  C07F7/08 ,  C08G77/14 ,  C08G77/24 ,  C08L83/06 ,  C08L83/08 ,  G03F7/004 ,  G03F7/075 ,  C08G77/04 ,  C08L83/04 ,  C08L83/14 ,  C07F7/04 ,  C07F7/21 ,  G03F7/039

Abstract: A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A and A are an acid-dissociable monovalent organic group, R is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

公开(公告)号：JP2007114431A

公开(公告)日：2007-05-10

申请号：JP2005304946

申请日：2005-10-19

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SHIMIZU DAISUKE ,  MATSUMURA SHINJI ,  NISHIYAMA SATORU ,  KAI TOSHIYUKI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a chemically amplified positive radiation-sensitive resin composition that is superior in roughness, etching resistance, sensitivity and resolution, capable of stably forming a fine pattern with high accuracy, and suitable for use as a resin composition for EB or EUV, effectively sensitive to an electron beam or extreme-ultraviolet radiation. SOLUTION: The positive radiation-sensitive resin composition contains a radiation-sensitive acid generator (A), capable of generating an acid upon irradiation with radiation, an acid-dissociable group-containing resin (B) which is alkali-insoluble or slightly alkali-soluble and becomes readily alkali-soluble by the action of an acid; an acid propagator (C) capable of generating an acid in a chain reaction by the action of an acid; and a photosensitive basic compound (D), which loses its basicity upon irradiation with radiation, wherein the acid propagator (C) is a compound, having a sulfonate group represented by Formula (1) on a carbon-ring skeleton. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有优异的粗糙度，耐腐蚀性，灵敏度和分辨率的化学放大正性辐射敏感性树脂组合物，能够以高精度稳定地形成精细图案，并且适合用作树脂 用于EB或EUV的组合物，对电子束或极紫外辐射有效敏感。 解决方案：正性辐射敏感性树脂组合物含有辐射敏感性酸产生剂（A），其能够在辐射照射时产生酸，碱解不溶性基团的树脂（B）是碱不溶性的或 稍微碱溶性，并通过酸的作用变得容易碱溶; 能够通过酸的作用产生链反应中的酸的酸传播体（C） 和感光性碱性化合物（D），其在辐射照射时失去其碱性，其中酸传播剂（C）是在碳环骨架上具有由式（1）表示的磺酸酯基的化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007092018A

公开(公告)日：2007-04-12

申请号：JP2006036868

申请日：2006-02-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAGAI TOMOKI ,  MIZUNO HIROMI ,  YOSHIDA KOICHIRO ,  YAMAGUCHI KEIICHI ,  SHIMIZU DAISUKE ,  MATSUMURA SHINJI ,  NISHIYAMA SATORU ,  KAI TOSHIYUKI

IPC: C08F8/12 ,  C08F212/14 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin excellent in the resolution performance, sensitivity and latitude of exposure. SOLUTION: The copolymer concerned is obtained by copolymerizing a monomer expressed by formula (1) (wherein, R 1 is a hydrogen atom or a methyl group; and R 2 and R 3 are each a saturated hydrocarbyl group) and monomers containing a monomer having a specific tertiary ether group and then by hydrolyzing with an acid perfectly an acid-dissociative group of the monomer expressed by formula (1) and besides by hydrolyzing a part of the acid-dissociative group of the monomer. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供在分辨率性能，灵敏度和曝光度方面优异的辐射敏感性树脂。 解决方案：所述共聚物通过共聚由式（1）表示的单体（其中R 1 为氢原子或甲基）和R SP SP 2 >和R 3 各自为饱和烃基）和含有具有特定叔醚基的单体的单体，然后通过酸完全酸解由式（1）表示的单体的酸解离基团 ），并且除了水解单体的酸解离基团的一部分外。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007058159A

公开(公告)日：2007-03-08

申请号：JP2006007034

申请日：2006-01-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIYAMA SATORU ,  KAI TOSHIYUKI ,  SHIMIZU DAISUKE ,  MATSUMURA SHINJI

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist composition suitable for use in fine pattern formation with an electron beam or extreme-ultraviolet radiation. SOLUTION: The positive radiation sensitive resin composition contains a radiation-sensitive acid generator (A) which is at least one compound selected from among a sulfonyloxyimide compound, a sulfonium salt compound, an iodonium salt compound and a diazonium salt compound, an acid dissociable group-containing resin (B) which is alkali-insoluble or slightly alkali-soluble but becomes readily alkali-soluble by the action of acid, and an acid diffusion control agent (C), and the composition is patterned with EB, X-rays or EUV wherein the acid generator (A) is contained in an amount of 20-80 pts.wt. and the acid diffusion control agent (C) in an amount of 0.1-1 pt.wt., based on 100 pts.wt. of the acid dissociable group-containing resin (B). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供适用于电子束或极紫外辐射的精细图案形成中的抗蚀剂组合物。 阳离子敏感性树脂组合物含有辐射敏感性酸产生剂（A），其为选自磺酰氧基酰亚胺化合物，锍盐化合物，碘鎓盐化合物和重氮盐化合物中的至少一种化合物， 酸溶解性基团的树脂（B）是碱不溶性或微碱溶性但通过酸作用而容易碱溶解的酸和酸扩散控制剂（C），组合物用EB，X - 其中酸产生剂（A）的含量为20-80重量份。 和酸扩散控制剂（C），其量为0.1-1重量份，基于100重量份 的含酸解离基团的树脂（B）。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2002308990A

公开(公告)日：2002-10-23

申请号：JP2001111786

申请日：2001-04-10

Applicant: JSR CORP

Inventor： IWAZAWA HARUO ,  HAYASHI AKIHIRO ,  NISHIYAMA SATORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08G77/14 ,  C08K5/00 ,  C08L83/06 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a polysiloxane which can give a radiation-sensitive resin composition having a high transparency to light of a wavelength of 193 nm or shorter and being highly sensitive, and excellent in dry etching resistance, developability, adhesion to a substrate, or the like, to provide a method for producing the same, and to obtain a radiation-sensitive resin composition containing the polysiloxane. SOLUTION: The polysiloxane is an alkali-insoluble or difficulty alkali-soluble acid-dissociable-group-containing polysiloxane which becomes alkali-soluble when the acid-dissociable groups are dissociated and has an Mw/Mn ratio of at most 2.5. The polysiloxane is produced by a method having a step of polycondensing a starting silane compound in the presence of an acid catalyst.

公开(公告)号：JP2006030506A

公开(公告)日：2006-02-02

申请号：JP2004208090

申请日：2004-07-15

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAI TOSHIYUKI ,  NISHIYAMA SATORU ,  MATSUMURA SHINJI ,  OKUMURA KATSUYA

IPC: G03F7/38 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method for forming a fine pattern to stably form a fine pattern with high accuracy and excellent in roughness, etching durability, sensitivity and resolution, and to provide a medium for post exposure baking on applying an electric field effective for the method.
SOLUTION: The method for forming a fine pattern having high sensitivity is carried out by using a chemically amplified positive resist or a chemically amplified negative resist. The method includes steps of forming a resist film 11 comprising the chemically amplified positive resist or chemically amplified negative resist on a substrate 10, irradiating the resist film 11 with radiation to produce an acid, disposing a medium 12 satisfying the following conditions (I), (II) on the resist film on heating the film after irradiation with radiation, and applying an electric field on the resist film 11. The conditions are: (I) the medium has ≥0.01 μS/cm electric conductivity; and (II) the medium has low dissolving property with the resist film and when the medium is left to stand at 23°C for 60 seconds and removed with water, it satisfies (the resist film thickness after removing with water)/(the resist film thickness before the medium is deposited)×100≥95.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种形成精细图案的方法，以高精度和优异的粗糙度，蚀刻耐久性，灵敏度和分辨率稳定地形成精细图案，并提供用于后曝光烘烤的介质， 电场有效的方法。 解决方案：通过使用化学放大的正性抗蚀剂或化学放大的负性抗蚀剂来进行形成具有高灵敏度的精细图案的方法。 该方法包括以下步骤：在衬底10上形成包含化学放大的正性抗蚀剂或化学放大的负性抗蚀剂的抗蚀剂膜11，用辐射照射抗蚀剂膜11以产生酸，设置满足以下条件（I）的介质12， （II）在辐射照射后对膜进行加热，并在抗蚀剂膜11上施加电场。条件是：（I）介质具有≥0.01μS/ cm的电导率; 和（II）介质与抗蚀剂膜的溶解性低，当将介质在23℃下放置60秒钟并用水除去时，满足（除去水后的抗蚀剂膜厚度）/（抗蚀剂 介质沉积前的膜厚度）×100≥95。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004117959A

公开(公告)日：2004-04-15

申请号：JP2002282756

申请日：2002-09-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAI TOSHIYUKI ,  NISHIYAMA SATORU

IPC: G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist composition adequate for micropattern formation by electron beams and X-rays. SOLUTION: The resist composition contains an acid generating agent having the structure of formula (1) and a resin having a functional group to increase solubility in an alkali by the effect of an acid, in which the resolution in forming the patterns of the resist composition is ≤90 nm. In the formula, R denotes a univalent organic group of ≤50wt% in fluorine content, nitro group, cyano group or hydrogen atom; Z 1 and Z 2 mutually independently denote fluorine atoms, or 1-10C straight chain- or branch-like perfluroalkyl groups. Accordingly, the resist composition can achieve sensitivity, resolution, roughness, and more particularly high resolution. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供足够用于通过电子束和X射线形成微图案的抗蚀剂组合物。 解决方案：抗蚀剂组合物含有具有式（1）结构的酸产生剂和具有官能团的树脂，以通过酸的作用增加在碱中的溶解度，其中形成图案的分辨率 抗蚀剂组成≤90nm。 在该式中，R表示氟含量≤70％的一价有机基团，硝基，氰基或氢原子; Z 1 和Z 2 相互独立地表示氟原子，或1-10C直链或支链状全氟烷基。 因此，抗蚀剂组合物可以实现灵敏度，分辨率，粗糙度和更高分辨率。 版权所有（C）2004，JPO

公开(公告)号：JP2005084365A

公开(公告)日：2005-03-31

申请号：JP2003316385

申请日：2003-09-09

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAI TOSHIYUKI ,  NISHIYAMA SATORU ,  TSUJI TAKAYUKI

IPC: G03F7/004 ,  C08F12/30 ,  C08F20/00 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To ensure excellence in roughness, etching resistance, sensitivity and resolution and to accurately and stably form a fine pattern. SOLUTION: The radiation-sensitive resin composition contains a polymer having an onium salt structural unit represented by formula (1) and/or formula (2) as a repeating unit, wherein R 1 represents H, halogen, cyano, a 1-5C linear or branched alkyl or haloalkyl; R 2 and R 3 each independently represent a substituted or unsubstituted 1-10C linear or branched alkyl, alkoxy or haloalkyl or a 6-20C aryl; A 1 represents a single bond, an ether bond, an ester bond or an amido bond; and X - represents an anion. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：确保粗糙度，耐蚀刻性，灵敏度和分辨率的卓越性，并精确而稳定地形成精细图案。 解决方案：该辐射敏感性树脂组合物含有具有由式（1）和/或式（2）表示的鎓盐结构单元作为重复单元的聚合物，其中R 1表示H ，卤素，氰基，1-5C直链或支链烷基或卤代烷基; R 2 和R 3 各自独立地表示取代或未取代的1-10C直链或支链烷基，烷氧基或卤代烷基或6-20C芳基; A 1 表示单键，醚键，酯键或酰胺键; 而X - 表示阴离子。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2002278073A

公开(公告)日：2002-09-27

申请号：JP2001077042

申请日：2001-03-16

Applicant: JSR CORP

Inventor： IWAZAWA HARUO ,  NISHIYAMA SATORU ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/075 ,  C08K5/00 ,  C08L83/06 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition containing a specified polysiloxane, having high transparency to radiation of and X are each a monovalent organic group which is dissociated by an acid and generates H or H (but the case of X =H is excluded); R" is H, methyl or trifluoromethyl; and (m) and (n) are each an integer of 0-3.