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公开(公告)号：DE602005004220T2
公开(公告)日：2009-01-08
申请号：DE602005004220
申请日：2005-10-11
Applicant: JSR CORP
Inventor： SAKURAI FUJIO , KOUMURA TOMOO , IGARASHI YOSHINORI
Abstract: A polishing pad having a polishing layer which has specific composition and a ratio of the storage elastic modulus at 30°C to the storage elastic modulus at 60°C of 2 to 15 and a ratio of the storage elastic modulus at 30°C to the storage elastic modulus at 90°C of 4 to 20 and is made of a polyurethane or polyurethane-urea. This polishing pad suppresses the scratching of the surface to be polished and planarizes the surface efficiently. A polishing pad having a polishing layer containing water-soluble particles can achieve a higher removal rate.
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公开(公告)号：DE602005004220D1
公开(公告)日：2008-02-21
申请号：DE602005004220
申请日：2005-10-11
Applicant: JSR CORP
Inventor： SAKURAI FUJIO , KOUMURA TOMOO , IGARASHI YOSHINORI
Abstract: A polishing pad having a polishing layer which has specific composition and a ratio of the storage elastic modulus at 30°C to the storage elastic modulus at 60°C of 2 to 15 and a ratio of the storage elastic modulus at 30°C to the storage elastic modulus at 90°C of 4 to 20 and is made of a polyurethane or polyurethane-urea. This polishing pad suppresses the scratching of the surface to be polished and planarizes the surface efficiently. A polishing pad having a polishing layer containing water-soluble particles can achieve a higher removal rate.
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公开(公告)号：JP2005340271A
公开(公告)日：2005-12-08
申请号：JP2004153335
申请日：2004-05-24
Inventor： KAWAHARA KOJI , HASEGAWA TORU , SAKURAI FUJIO
CPC classification number: B24B37/26
Abstract: PROBLEM TO BE SOLVED: To provide a pad for polishing a chemical machine which can suitably be adapted to the polishing of a metal film and an insulating film by which a flat polishing face can be obtained and slurry is efficiently removed, and which has a sufficient life, can give high polishing speed, and has a scratch reduction effect. SOLUTION: In the polishing pad, a groove is formed on a polishing face so as to crosse one virtual straight line from the center of the polishing face to a peripheral part for a plurality of times. A groove width is in a range of 0.1 to 1.5 mm, and a groove depth is in a range of 0.9 to 9.8 mm. A minimum distance between adjacent intersections crossing the virtual straight line is in a range of 0.3 to 2.0 mm. A ratio of the depth with respect to the thickness of the polishing pad is in a range of 1/7 to 1/1.1. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 要解决的问题：提供一种用于抛光适合于抛光金属膜和绝缘膜的化学机器的垫，通过该抛光可以获得平坦的抛光面并有效地除去浆料，并且其中 具有足够的使用寿命，可以提供高抛光速度，并具有刮擦效果。 解决方案：在抛光垫中，在抛光面上形成一个凹槽，以将一个虚拟直线从抛光面的中心向周边部分多次穿过。 槽宽度在0.1〜1.5mm的范围内，槽深度在0.9〜9.8mm的范围内。 穿过虚拟直线的相邻交叉点之间的最小距离在0.3至2.0mm的范围内。 深度相对于抛光垫的厚度的比率在1/7至1 / 1.1的范围内。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2006111700A
公开(公告)日：2006-04-27
申请号：JP2004299522
申请日：2004-10-14
Inventor： SAKURAI FUJIO , KAWAMURA TOMOO , IGARASHI YOSHINORI
IPC: C08J5/14 , B24B37/20 , C08L75/04 , H01L21/304
Abstract: PROBLEM TO BE SOLVED: To obtain a scouring pad that controls occurrence of scratch on a surface to be scoured and yet efficiently flattens a surface to be scoured. SOLUTION: The scouring pad has a scouring layer composed of a polyurethane or a polyurethane-urea with a specific composition and having the ratio of storage elastic modulus at 30°C/60°C in the range of 2-15 and the ratio of storage elastic modulus at 30°C/90°C in the range of 4-20. A higher polishing rate is attained in the case of a scouring pad in which water-soluble particles are dispersed in the scouring layer. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 要解决的问题：获得控制要擦洗的表面上的划痕发生的擦洗垫，并且有效地平坦化被冲洗的表面。 洗涤垫具有由具有特定成分的聚氨酯或聚氨酯 - 尿素构成的擦洗层，并且在30℃/ 60℃下的储存弹性模量的比例在2-15范围内， 30℃/ 90℃下的储存弹性模量比在4-20范围内。 在其中水溶性颗粒分散在擦洗层中的洗涤垫的情况下，获得更高的抛光速率。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2002201282A
公开(公告)日：2002-07-19
申请号：JP2000402549
申请日：2000-12-28
Applicant: JSR CORP
Inventor： KASAI KIYOSHI , TAMORI KOJI , SAKURAI FUJIO
IPC: C08J3/05 , C08L83/04 , C08L101/12 , C09D5/00 , C09D183/04
Abstract: PROBLEM TO BE SOLVED: To provide an aqueous dispersion of polyorganosiloxane particles which shows an excellent crack resistance at a dried state when used as a coating and also exhibits an excellent weather resistance, water resistance, stain resistance and adhesion, and its preparation process. SOLUTION: The aqueous dispersion of polyorganosiloxane particles is obtained by allowing a seed polymer particle (A) having a weight average molecular weight of from 500 to 30,000 to absorb a silane component (B) comprising at least one chosen from an organosilane, its hydrolysate and its condensate in an aqueous medium and subsequently subjecting it to a condition under which the silane component (B) is hydrolyzed and condensed.
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Patent Agency Ranking
公开(公告)号：JP2002030113A
公开(公告)日：2002-01-31
申请号：JP2000318277
申请日：2000-10-18
Applicant: JSR CORP
Inventor： SAKURAI FUJIO , ZAMA YOSHIAKI , KURITA OSAMU
IPC: B01J13/04 , B01J19/00 , C08F2/00 , C08F2/22 , C08F2/44 , C08F8/44 , C08F285/00 , C08K3/00 , C08L51/06 , C08L101/00 , D21H19/42 , D21H21/54
Abstract: PROBLEM TO BE SOLVED: To provide hollow polymer particles being satisfactory in hiding power, gloss, strengths, water resistance, alkali resistance, and weathering resistance and having a uniform particle diameter and a high hollow rate and a method for producing the same. SOLUTION: The hollow polymer particles are obtained by emulsion- polymerizing 100 pts.wt. monomer mixture comprising 5-80 wt.% unsaturated carboxylic acid and 20-95 wt.% radical-polymerizable monomer in the presence of 2-50 pts.wt. (A) polymer particles obtained by emulsion-polymerizing a monomer mixture comprising an unsaturated carboxylic acid and a radical- polymerizable monomer in an aqueous medium to obtain (B) polymer particles, emulsion-polymerizing 100 pts.wt. (c) monomer mixture comprising 0-20 wt. % unsaturated carboxylic acid and 80-100 wt.% radical-polymerizable monomer in the presence of 3-100 pts.wt. particles B to obtain (C) core/shell polymer particles in each of which the shell is a coating of the polymer derived from monomer mixture (c), and adjusting a dispersion of particles C to a pH of at least 7 with a volatile base to effect the neutralization of swelling of particles C.
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公开(公告)号：JPH1150394A
公开(公告)日：1999-02-23
申请号：JP22113297
申请日：1997-08-01
Applicant: JSR CORP
Inventor： SAKURAI FUJIO , ISHIKAWA OSAMU , ZAMA YOSHIAKI , TSURUOKA KATSUHIKO
Abstract: PROBLEM TO BE SOLVED: To provide a copolymer latex capable of giving coating compositions enabling to improve resistance to roll staining highly obstructing the luster and improvement of white paper without sacrificing an important adhesive strength performance of the obtained coated paper, even the coated paper is subjected to a calendering treatment with a soft nip calender at a high temperature. SOLUTION: This copolymer latex is obtained by copolymerizing (a) 20-80 wt.% of an aliphatic conjugated diene monomer, (b) 0.5-10 wt.% of an ethylenic unsaturated carboxylic acid monomer and (c) 20-79.5 wt.% of one or more other monomers capable of being copolymerized with the monomers [wherein the total amount of the monomers (a), (b) and (c) is 100 wt.%), and has at least two glass transition points in a temperature range of -100 to 50 deg.C wherein the difference between the highest glass transition point and the lowest glass transition point is >=5 deg.C.
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公开(公告)号：JP2004330411A
公开(公告)日：2004-11-25
申请号：JP2004118514
申请日：2004-04-14
Inventor： SAKURAI FUJIO , MIHARA IWAO , IGARASHI YOSHINORI , HASEGAWA TORU
Abstract: PROBLEM TO BE SOLVED: To provide a polishing pad with excellent flattening capability of a polished material, superior in polishing stability and holding property of slurry during polishing and after dressing, the pad which effectively prevents lowering of polishing speed and a manufacturing method for the polishing pad. SOLUTION: In order to manufacture a polishing pad, water-soluble particles, for example β-cyclodextrin are dispersed to a crosslinking agent, for example polypropylene glycol to obtain dispersion liquid. The dispersion liquid is mixed with polyisocyanate, for example 4,4'-diphenylmethane di-isocyanate and/or isocyanate end urethane prepolymer, and mixture liquid is reacted. The water-soluble particles are dispersed in polymer matrix. COPYRIGHT: (C)2005,JPO&NCIPI
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公开(公告)号：JP2003054141A
公开(公告)日：2003-02-26
申请号：JP2001246068
申请日：2001-08-14
Applicant: Jsr Corp , ジェイエスアール株式会社
Inventor： SAKURAI FUJIO , SHIMAKAGE MASAFUMI , HATTORI IWAKAZU
Abstract: PROBLEM TO BE SOLVED: To provide a newly rewritable heat-sensitive display medium with such advantages that the contrast is sharp and almost no change over time during repeatedly using the medium occurs and further, and that its manufacturing cost is low. SOLUTION: The rewritable heat-sensitive display medium has at least (i) a heat-sensitive information recording layer formed of a shape-memory resin containing a gas and (ii) a colored layer or an light reflecting metallic layer. The rewritable heat-sensitive display medium may have (i) the heat-sensitive information recording layer formed on both sides of the medium and also may have an adhesive layer (iv) between (i) the heat-sensitive information recording layer and (ii) the coloring layer or the light-reflecting metallic layer or may have (v) a protecting layer.
Abstract translation: 要解决的问题：为了提供一种新的可重写热敏显示介质，具有这样的优点，即在反复使用介质的同时，对比度是明显的，并且随着时间的推移几乎没有变化，并且其制造成本低。 解决方案：可重写热敏显示介质至少具有（i）由含有气体的形状记忆树脂和（ii）着色层或光反射金属层形成的热敏信息记录层。 可重写热敏显示介质可以具有（i）形成在介质两侧的热敏信息记录层，并且还可以在（i）热敏信息记录层和（ii）之间具有粘合剂层 ）着色层或光反射金属层，或者可以具有（v）保护层。
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10.发明专利
公开(公告)号：JP2002201243A
公开(公告)日：2002-07-19
申请号：JP2000402548
申请日：2000-12-28
Applicant: JSR CORP
Inventor： KASAI KIYOSHI , SAKURAI FUJIO , TAMORI KOJI
IPC: C08F291/16 , C09D4/06 , C09D183/04 , C09D201/00
Abstract: PROBLEM TO BE SOLVED: To provide an aqueous dispersion of polyorganosiloxane/organic polymer composite particles which, when used for a coating material, is excellent in craze resistance in drying and excellent in adhesiveness and resistances to weather, water, and staining; and a production method of the same. SOLUTION: This aqueous dispersion is prepared by causing (A) 1 pt.wt. seed polymer particles having a wt. average mol.wt. of 500-30,000 to absorb (B) 1-50 pts.wt. at least one silane component selected from among organosilanes, hydrolyzates of the organosilanes, and condensates of the organosilanes and (C) 1-100 pts.wt. free-radically polymerizable monomer in an aqueous medium and subjecting the silane component (B) to hydrolysis and condensation conditions and the free-radically polymerizable monomer to free- radical polymerization conditions.
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