公开(公告)号：JPH10239865A

公开(公告)日：1998-09-11

申请号：JP5554997

申请日：1997-02-24

Applicant: JSR CORP

Inventor： OTA TOSHIYUKI ,  TASHIRO HIDEAKI ,  SANO KIMIYASU ,  SATO HOZUMI

IPC: G03F7/42

Abstract: PROBLEM TO BE SOLVED: To provide a stripping solution superior in strippability and small in problems on freeze in outdoor storage in winter and the like and small in problems on toxicity and environmental pollution by specifying the composition of the stripping solution. SOLUTION: This stripping solution for the negative photoresist comprises 30-75weight% dimethylsulfoxide and 20-65weight% 1,3-dimethyl-2-imidazolidinone and 0.1-5weight% tetralkylammonium hydroxide and 0.5-15weight% water, and it is preferred to add the dimethylsulfoxide in an amount of 40-70weight%, and if 75weight%, it freezes in storage at low temperature. The 1,3-dimethyl-2-imidazolidinone is contained, preferably, in an amount of 25-60weight%, and if 65weight%, it takes long time to strip the resist.