公开(公告)号：DE69807760T2

公开(公告)日：2003-08-14

申请号：DE69807760

申请日：1998-01-26

Applicant: JSR CORP

Inventor： OTA TOSHIYUKI ,  SANO KIMIYAKU ,  OHTA MASARU ,  SATO HOZUMI

IPC: G03F7/004 ,  C08G8/08 ,  G03F7/022 ,  G03F7/023 ,  G03F7/033 ,  H01L21/027

Abstract: A positive photoresist composition including (A) 100 parts by weight of an alkali-soluble novolak resin, and based thereon; (B) 5 to 50 parts by weight of an alkali-soluble acrylic resin containing, as s, 10 to 80% by weight of a unit of a radical-polymerizable compound having an alcoholic hydroxyl group and 3 to 50% by weight of at least one of a unit of a radical-polymerizable compound having a carboxyl group and a unit of a radical-polymerizable compound having a phenolic hydroxyl group; (C) 5 to 100 parts by weight of a quinonediazide group-containing compound; and (D) a solvent, is provided. This composition has a good adhesion to substrates at the time of development and a good plating solution resistance and moreover can be well wetted with plating solutions, can be well developed with alkali developing solutions and can be well stripped from substrates at the resist unexposed areas, and is suited for the formation of thick films suitable as bump forming materials.

公开(公告)号：DE69807760D1

公开(公告)日：2002-10-17

申请号：DE69807760

申请日：1998-01-26

Applicant: JSR CORP

Inventor： OTA TOSHIYUKI ,  SANO KIMIYAKU ,  OHTA MASARU ,  SATO HOZUMI

IPC: G03F7/004 ,  C08G8/08 ,  G03F7/022 ,  G03F7/023 ,  G03F7/033 ,  H01L21/027

Abstract: A positive photoresist composition including (A) 100 parts by weight of an alkali-soluble novolak resin, and based thereon; (B) 5 to 50 parts by weight of an alkali-soluble acrylic resin containing, as s, 10 to 80% by weight of a unit of a radical-polymerizable compound having an alcoholic hydroxyl group and 3 to 50% by weight of at least one of a unit of a radical-polymerizable compound having a carboxyl group and a unit of a radical-polymerizable compound having a phenolic hydroxyl group; (C) 5 to 100 parts by weight of a quinonediazide group-containing compound; and (D) a solvent, is provided. This composition has a good adhesion to substrates at the time of development and a good plating solution resistance and moreover can be well wetted with plating solutions, can be well developed with alkali developing solutions and can be well stripped from substrates at the resist unexposed areas, and is suited for the formation of thick films suitable as bump forming materials.

公开(公告)号：DE69522786T2

公开(公告)日：2002-05-23

申请号：DE69522786

申请日：1995-12-05

Applicant: JSR CORP

Inventor： KANDA KAZUNORI ,  UEDA KOICHI ,  KAKIUCHI TADAHIRO ,  MURAMOTO HISAICHI ,  YASUDA KENJI ,  SATO HOZUMI ,  KOSHIMURA KATSUO ,  NISHIOKA TAKASHI

IPC: G03F7/027 ,  G03F7/00 ,  G03F7/028 ,  G03F7/033 ,  G03F7/32

Abstract: A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises: (1) a granular copolymer produced by polymerizing a monomer mixture comprising: (i) an aliphatic conjugated diene monomer; (ii) a monomer expressed by the general formula (I): (in which R represents a hydrogen atom or a methyl group, R represents an alkylene group having a carbon number of 3 to 20, and l represents an integer of 1 to 20); (iii) a monomer having at least two addition-polymerizable groups, and (iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable; (2) a photo-polymerizable unsaturated monomer; (3) an amino group-containing compound, and (4) a photo-polymerization initiator.

公开(公告)号：EP1095938A4

公开(公告)日：2005-01-05

申请号：EP99960679

申请日：1999-06-25

Applicant: JSR CORP

Inventor： SUGIYAMA NAOKI ,  SEKIGUCHI MANABU ,  SATO HOZUMI

IPC: C07D305/06 ,  C07D407/04 ,  C07D409/04 ,  C08F16/26 ,  C08F216/14 ,  C08G61/12 ,  C08G65/18 ,  C08G65/22 ,  C08F214/28 ,  C08G59/38

CPC classification number: C07D407/04 ,  C07D305/06 ,  C07D409/04 ,  C08F16/26 ,  C08F216/14 ,  C08G61/12 ,  C08G65/18 ,  C08G65/22

Abstract: Oxetane compounds represented by general formula (1), which are excellent in radical polymerizability and cationic polymerizability and in compatibility and copolymerizability with other copolymerizable monomers; a process for producing the compounds; and an oxetane copolymer which is excellent in compatibility among the monomer units and has a low water absorption and excellent transparency. [In general formula (1), substituent R1 is hydrogen, alkyl, fluorine, fluoroalkyl, allyl, aryl, furyl, or thienyl; substituents R?2, R3, and R4¿ each independently is hydrogen or C¿1-6? alkyl; and m and n each is an integer of 1 to 10 (provided that not all of R?2, R3, and R4¿ are hydrogen)].

公开(公告)号：DE69941954D1

公开(公告)日：2010-03-11

申请号：DE69941954

申请日：1999-06-25

Applicant: JSR CORP

Inventor： SUGIYAMA NAOKI ,  SEKIGUCHI MANABU ,  SATO HOZUMI

IPC: C07D305/06 ,  C07D407/04 ,  C07D409/04 ,  C08F16/26 ,  C08F214/28 ,  C08F216/14 ,  C08G59/38 ,  C08G61/12 ,  C08G65/18 ,  C08G65/22

Abstract: Oxetane compounds represented by general formula (1), which are excellent in radical polymerizability and cationic polymerizability and in compatibility and copolymerizability with other copolymerizable monomers; a process for producing the compounds; and an oxetane copolymer which is excellent in compatibility among the monomer units and has a low water absorption and excellent transparency. ÄIn general formula (1), substituent R is hydrogen, alkyl, fluorine, fluoroalkyl, allyl, aryl, furyl, or thienyl; substituents R , R , and R each independently is hydrogen or C1-6 alkyl; and m and n each is an integer of 1 to 10 (provided that not all of R , R , and R are hydrogen)Ü.

公开(公告)号：DE69913884T2

公开(公告)日：2004-12-09

申请号：DE69913884

申请日：1999-06-17

Applicant: JSR CORP

Inventor： SEKIGUCHI MANABU ,  SUGIYAMA NAOKI ,  SATO HOZUMI

IPC: C09D183/04 ,  C09D4/00 ,  C09D183/06 ,  G03F7/075

Abstract: Disclosed is a photo-curable composition comprising the following components (A) to (C): (A) hydrolyzable silane compound represented by the general formula (1) or a hydrolyzate thereof: (R )pSi(X)4-p (1) wherein R is a non-hydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer of 0 to 3; (B) photo acid generator; and (C) dehydrating agent. By such constitution, it is possible to provide a photo-curable composition which has a rapid photo-curable rate, is excellent in characteristics such as storage stability, heat resistance, weather-ability, scratch resistance and the like, and is applicable to base materials having low heat resistance such as plastics, as well as a cured product obtained therefrom.

公开(公告)号：DE69913884D1

公开(公告)日：2004-02-05

申请号：DE69913884

申请日：1999-06-17

Applicant: JSR CORP

Inventor： SEKIGUCHI MANABU ,  SUGIYAMA NAOKI ,  SATO HOZUMI

IPC: C09D183/04 ,  C09D4/00 ,  C09D183/06 ,  G03F7/075

Abstract: Disclosed is a photo-curable composition comprising the following components (A) to (C): (A) hydrolyzable silane compound represented by the general formula (1) or a hydrolyzate thereof: (R )pSi(X)4-p (1) wherein R is a non-hydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer of 0 to 3; (B) photo acid generator; and (C) dehydrating agent. By such constitution, it is possible to provide a photo-curable composition which has a rapid photo-curable rate, is excellent in characteristics such as storage stability, heat resistance, weather-ability, scratch resistance and the like, and is applicable to base materials having low heat resistance such as plastics, as well as a cured product obtained therefrom.

公开(公告)号：DE69522786D1

公开(公告)日：2001-10-25

申请号：DE69522786

申请日：1995-12-05

Applicant: NIPPON PAINT CO LTD ,  JSR CORP

Inventor： KANDA KAZUNORI ,  UEDA KOICHI ,  KAKIUCHI TADAHIRO ,  MURAMOTO HISAICHI ,  YASUDA KENJI ,  SATO HOZUMI ,  KOSHIMURA KATSUO ,  NISHIOKA TAKASHI

IPC: G03F7/027 ,  G03F7/00 ,  G03F7/028 ,  G03F7/033 ,  G03F7/32

Abstract: A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises: (1) a granular copolymer produced by polymerizing a monomer mixture comprising: (i) an aliphatic conjugated diene monomer; (ii) a monomer expressed by the general formula (I): (in which R represents a hydrogen atom or a methyl group, R represents an alkylene group having a carbon number of 3 to 20, and l represents an integer of 1 to 20); (iii) a monomer having at least two addition-polymerizable groups, and (iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable; (2) a photo-polymerizable unsaturated monomer; (3) an amino group-containing compound, and (4) a photo-polymerization initiator.

公开(公告)号：JP2001294676A

公开(公告)日：2001-10-23

申请号：JP2000112043

申请日：2000-04-13

Applicant: JSR CORP

Inventor： HARA TAKEO ,  IWANAGA SHINICHIRO ,  SATO HOZUMI

IPC: C08J5/18 ,  B29B11/16 ,  B29C70/06 ,  H01L23/36 ,  H01L23/373

Abstract: PROBLEM TO BE SOLVED: To provide a heat-conductive sheet which has high anisotropic heat conductivity in the thickness direction, can efficiently release heat from heat generators such as semiconductor elements or semiconductor packages, has excellent heat resistance, durability and mechanical strength, and has excellent adhesivity to the heat generators. SOLUTION: This heat-conductive sheet is characterized in that carbon fibers are disposed in the thickness direction and exposed to the surface of the sheet or contained in a binder in an exposable state and in that magnets and the carbon fibers are disposed in the cured or semi-cured binder in the thickness direction of the heat-conductive sheet. The method for producing the heat- conductive sheet, is characterized by forming a composition for the heat- conductive sheet in a sheet-like shape, and then applying a magnetic field to the composition in the thickness direction of the sheet-like composition to orient the magnetic layer-coated carbon fibers in the thickness direction of the sheet- like composition and simultaneously cure or semi-cure the sheet-like composition.

公开(公告)号：JP2000169755A

公开(公告)日：2000-06-20

申请号：JP34670798

申请日：1998-12-07

Applicant: JSR CORP

Inventor： SEKIGUCHI MANABU ,  SUGIYAMA NAOKI ,  SATO HOZUMI

IPC: B32B9/00 ,  B01J35/02 ,  B32B27/00 ,  C09D5/00 ,  C09D183/04

Abstract: PROBLEM TO BE SOLVED: To provide a hydrophilic cured material which has excellent hydrophilicity and can be formed by photo-curing reaction even in the presence of oxygen, a laminate containing it, a composition for the hydrophilic cured material, and a manufacturing method of the hydrophilic cured material. SOLUTION: The hydrophilic cured material is formed by photo-curing a photo-curing composition comprising the following (A)-(C) components: (A) at least one compound selected from the group consisting of a hydrolyzable silane compound represented as formula (R1)pSi(X)4-p [in general formula (1), R1 is a 1-12C non-hydrolyzable organic group, X is a hydrolyzable group and p is an integer of 0-3], its hydrolyzed compound and its condensation product, (B) a photooxidation agent, and (C) a photocatalyst.