公开(公告)号：DE69325480T2

公开(公告)日：2000-03-30

申请号：DE69325480

申请日：1993-07-23

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  ENDO MASAYUKI ,  SHIMADA ATSUFUMI ,  YOKOYAMA YASUAKI ,  BESSHO NOBUO

IPC: C08G81/00 ,  C08F2/50 ,  C08F220/04 ,  C08F220/32 ,  C08F222/04 ,  H05K3/28 ,  C08F291/10

Abstract: An epoxy group-containing thermosetting resin composition comprising (A) a copolymer obtained from (a) at least one member selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, (b) an epoxy group-containing unsaturated compound, (c) a monoolefin unsaturated compound, and (d) a conjugated diolefin unsaturated compound, and (B) an organic solvent for dissolving the above copolymer. There is also provided epoxy-group containing radiation sensitive resin composition which contains a component (A) obtained from (a), (b) and (c) and optionally (d), (C) a polymerizable compound having at least one ethylenically unsaturated double bond, and (D) a photopolymerization initiator. These epoxy-group containing thermosetting resin compositions are excellent in storage stability.

公开(公告)号：JP2005134440A

公开(公告)日：2005-05-26

申请号：JP2003367211

申请日：2003-10-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SANO KIMIYASU ,  NISHIKAWA MICHINORI ,  MINOWA TAKAKI ,  TAKAMOTO EIJI

IPC: G03F7/004 ,  G02B1/04 ,  G02B3/00 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is safe for a living body, which has favorable coating property even for a large substrate, high sensitivity, sufficient development margin, high solvent resistance, high heat resistance and high transmittance, and in particular, which is useful for forming an interlayer insulating film and a microlens, and to provide an interlayer insulating film and a microlens formed from the composition, and a method for forming them. SOLUTION: The radiation-sensitive resin composition contains (A) an alkali-soluble resin, (B) a radiation-sensitive acid generating agent and (C) an organic solvent represented by 1-methoxy-2-(2-methoxypropoxy)propane, 1-methyl-2-methoxyethyl propionate, 2-n-propoxypropyl acetate or the like. The method for forming an interlayer insulating film and a microlens includes the steps of: (i) forming a coating film of the above composition on a substrate; (ii) exposing to radiation; (iii) developing; and (iv) heating. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供对于生物体安全的辐射敏感性树脂组合物，即使对于大的基材也具有良好的涂布性，高灵敏度，足够的显影余量，高耐溶剂性，高耐热性和 高透射率，特别是可用于形成层间绝缘膜和微透镜，以及提供由该组合物形成的层间绝缘膜和微透镜及其形成方法。 解决方案：辐射敏感性树脂组合物含有（A）碱溶性树脂，（B）辐射敏感性酸产生剂和（C）由1-甲氧基-2-（2-甲氧基丙氧基 ）丙烷，丙酸1-甲基-2-甲氧基乙酯，乙酸2-正丙氧基丙酯等。 形成层间绝缘膜和微透镜的方法包括以下步骤：（i）在基板上形成上述组成的涂膜; （ii）暴露于辐射; （iii）发展; 和（iv）加热。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2003307614A

公开(公告)日：2003-10-31

申请号：JP2003013549

申请日：2003-01-22

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SHINYAMA YASUMASA ,  NAGATSUKA TOMIO ,  SANO KIMIYASU

IPC: G03F7/038 ,  C08F220/32 ,  C08F222/00 ,  G02B5/20 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a semitransmission type color filter wherein peak values of a color layer in a light reflection region and in a light transmission region can be reduced, color purities when a backlight is used and when a color liquid crystal display element is used as a reflection type, can be made nearly equal to each other and the color purity especially when the backlight is used can be enhanced. SOLUTION: The semitransmission type color filter is characterized in that a protrusion part and the color layer are formed on a substrate, the protrusion part has a light reflection layer and the color layer is formed so as to cover the protrusion part and the rest of the surface of the substrate. The peak values of the color layer in the light reflection region and the light transmission region are preferably ≤0.1 μm. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种半透射型滤色器，其中可以减少光反射区域和光透射区域中的着色层的峰值，当使用背光时的颜色纯度和当彩色液晶 显示元件用作反射型，可以使其几乎相等，特别是当使用背光时，可以提高色纯度。 解决方案：半透射型滤色器的特征在于，在基板上形成有突出部和着色层，突出部具有光反射层，并且形成着彩色层以覆盖突出部和 衬底表面的其余部分。 光反射区域和透光区域中的着色层的峰值优选为≤0.1μm。 版权所有（C）2004，JPO

公开(公告)号：JP2002278060A

公开(公告)日：2002-09-27

申请号：JP2001076486

申请日：2001-03-16

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  MIYAJIMA FUMINAO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/022 ,  C08K5/13 ,  C08K5/42 ,  C08L61/10 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition ensuring good resolution and a good section shape of a pattern and suitable for use as a positive type resist having a good margin for exposure. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- soluble novolak resin and (B) a naphthoquinonediazidosulfonic ester compound of a phenol compound of formula (1) [where R1 and R2 are each a monovalent organic group having alkyl or aryl; R3 is H or alkyl; and (a) and (b) are each an integer of 0-2] having a structure corresponding to tertiary carbon in a position adjacent to a hydroxyl group. Preferably (C) a low molecular weight compound containing two or three benzene rings and having at least one hydroxyl group on each of the benzene rings is further contained.

公开(公告)号：JPH10207057A

公开(公告)日：1998-08-07

申请号：JP2721197

申请日：1997-01-27

Applicant: JSR CORP

Inventor： OTA TOSHIYUKI ,  OTA KATSU ,  SANO KIMIYASU ,  SATO HOZUMI

IPC: G03F7/004 ,  C08G8/08 ,  G03F7/022 ,  G03F7/023 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide the positive photosensitive composition good in adhesion to a substrate at the time of development and resistance to a plating liquid and superior in wettability by the plating liquid and developability with an alkaline solution and strippability of the nonexposed parts of the resist from the substrate and suitable to forming a thick film as a material for forming a bump. SOLUTION: This positive photoresist composition comprises (A) 100 pts.wt. of an alkali-soluble novolak resin; (B) 5-50 pts.wt. of an alkali-soluble acrylic resin comprising 10-80weight% radically polymerizable monomer units each having an alcoholic hydroxyl group and 3-50weight% radically polymerizable monomer units each having a carboxyl group and/or a radically polymerizable monomer units each having phenolic hydroxyl group; (C) 5-100 pts.wt. of a compound having a quinonediazido group; and (D) a solvent.

公开(公告)号：JP2003005372A

公开(公告)日：2003-01-08

申请号：JP2001185662

申请日：2001-06-19

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： SANO KIMIYASU ,  MISHIMA KENJI ,  KAJITA TORU ,  MIYAMATSU TAKASHI

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency particularly to ArF excimer laser light and excellent in basic solid state properties as a resist such as sensitivity, resolution and pattern shape.
SOLUTION: The radiation sensitive resin composition contains (A) an acid dissociable group-containing resin which is made alkali-soluble by the action of an acid, such as a copolymer of an unsaturated ether typified by n-butyl vinyl ether or 3,4-dihydro-2H-pyran, maleic anhydride and 2-methyl-2-adamantyl (meth)acrylate and (B) a radiation sensitive acid generator typified by 2,5- hexylene-(1-n-butoxynapht-4-yl) sulfonium nonafluoro-n-butanesulfonate, 4-(2- norbornylmethoxy)naphthyltetrahydrothiophenium nonafluoro-n-butanesulfonate or 2,5-hexylene-(1-hydroxy-2,6-dimethylphen-4-yl)sulfonium nonafluoro-n- butanesulfonate.
COPYRIGHT: (C)2003,JPO

Abstract translation: 要解决的问题：提供具有高透明度的辐射敏感性树脂组合物，特别是ArF准分子激光，并且具有优异的基本固态特性，作为诸如灵敏度，分辨率和图案形状的抗蚀剂。 解决方案：辐射敏感性树脂组合物含有（A）含酸解离基团的树脂，其通过酸的作用而制成碱溶性，例如以正丁基乙烯基醚为代表的不饱和醚或3,4 - 二氢-2H-吡喃，马来酸酐和（甲基）丙烯酸2-甲基-2-金刚烷酯和（B）以2,5-亚己基 - （1-正丁氧基萘-4-基）锍为代表的辐射敏感酸产生剂 九氟正丁磺酸盐，4-（2-降冰片基甲氧基）萘基四氢噻吩六氟正丁磺酸盐或2,5-亚己基 - （1-羟基-2,6-二甲基苯-4-基）锍九氟正丁基磺酸盐。

公开(公告)号：JP2000066211A

公开(公告)日：2000-03-03

申请号：JP22934699

申请日：1999-08-13

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  MIYAMOTO TAKESHI ,  SANO KIMIYASU ,  YOKOYAMA YASUAKI

IPC: G02F1/1337 ,  C08G73/10 ,  C08L79/08

Abstract: PROBLEM TO BE SOLVED: To provide a new liquid crystal alignment agent which can form a liquid crystal alignment layer for excellently aligning a liquid crystal by incorporating a soluble polyimide having a specified structural unit. SOLUTION: This liquid crystal alignment agent contains a soluble polyimide having the structural unit expressed by formula I. The structural unit expressed by formula I is produced by the reaction of tetracarboxylic acid dianhydride expressed by formula II and 4,4'-diaminodiphenylmethane as the starting material. The reaction of the tetracarboxylic acid dianhydride expressed by formula II and 4,4'-diaminodiphenylmethane is carried out by bringing the both compds. into contact with an org. solvent to produce polyamic acid, and then heating the polyamic acid as produced in the org. solvent or treating in the presence of a dehydrating agent and basic catalyst to imidize. In the formula, R1 is a fluorine atom or univalent org. group and a is an integer 0 to 4.

公开(公告)号：JP2000001614A

公开(公告)日：2000-01-07

申请号：JP10471299

申请日：1999-04-13

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  MIYAMOTO TAKESHI ,  SANO KIMIYASU ,  YOKOYAMA YASUAKI

IPC: G02F1/1337 ,  C08G73/10 ,  C08L79/08

Abstract: PROBLEM TO BE SOLVED: To obtain a liquid crystal orientating agent useful for providing a liquid crystal orientated film for a liquid crystal display element having a TN type sequence cell by including a specific soluble polyimide. SOLUTION: This liquid crystal orientating agent contains a soluble polyimide having a structural unit of formula I (R1 is a bifunctional organic group; R2 is fluorine or a monofunctional organic group; (a) is 0-2). The structural unit of formula I is obtained by bringing preferably 0.6-2.4 mols of a tetracarboxylic acid dianhydride of formula II into contact with 1 mol of a diamine compound of the formula H2N-R1-NH2 (e.g. paraphenylenediamine or the like) in an organic solvent preferably at 0-100 deg.C to form a polyamic acid and then heating the formed polyamic acid in an organic solvent preferably at 100-170 deg.C or imidating the polyamic acid in the presence of both a dehydrating agent (e.g. acetic anhydride or the like) and a basic catalyst (e.g. pyridine or the like) preferably at 60-150 deg.C.

公开(公告)号：JPH111602A

公开(公告)日：1999-01-06

申请号：JP16967297

申请日：1997-06-12

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  SATO HOZUMI

IPC: G03F7/004 ,  B24C1/04 ,  C08L57/10 ,  C08L75/14 ,  G03F7/027 ,  G03F7/028 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition having excellent developability with an alkaline developing solution and being desirable as a material for sandblast having a sufficient resolution even in a thickness of 20 μm or above and having excellent sandblast resistance, excellent adhesion to the substrate to be treated and excellent release from the substrate to be treated after curing and to provide a photosensitive dry film using the same. SOLUTION: This composition comprises an alkali-soluble copolymer comprising structural units derived from a carboxylcontaining radical-polymerizable compound, structural units derived from a conjugated diolefin compound and structural units derived from another radical-polymerizable compound, an urethane poly(meth)acrylate compound having at least two ethylenic unsaturations and a radical photopolymerization initiator.

公开(公告)号：JPH10239865A

公开(公告)日：1998-09-11

申请号：JP5554997

申请日：1997-02-24

Applicant: JSR CORP

Inventor： OTA TOSHIYUKI ,  TASHIRO HIDEAKI ,  SANO KIMIYASU ,  SATO HOZUMI

IPC: G03F7/42

Abstract: PROBLEM TO BE SOLVED: To provide a stripping solution superior in strippability and small in problems on freeze in outdoor storage in winter and the like and small in problems on toxicity and environmental pollution by specifying the composition of the stripping solution. SOLUTION: This stripping solution for the negative photoresist comprises 30-75weight% dimethylsulfoxide and 20-65weight% 1,3-dimethyl-2-imidazolidinone and 0.1-5weight% tetralkylammonium hydroxide and 0.5-15weight% water, and it is preferred to add the dimethylsulfoxide in an amount of 40-70weight%, and if 75weight%, it freezes in storage at low temperature. The 1,3-dimethyl-2-imidazolidinone is contained, preferably, in an amount of 25-60weight%, and if 65weight%, it takes long time to strip the resist.