公开(公告)号：DE69522786T2

公开(公告)日：2002-05-23

申请号：DE69522786

申请日：1995-12-05

Applicant: JSR CORP

Inventor： KANDA KAZUNORI ,  UEDA KOICHI ,  KAKIUCHI TADAHIRO ,  MURAMOTO HISAICHI ,  YASUDA KENJI ,  SATO HOZUMI ,  KOSHIMURA KATSUO ,  NISHIOKA TAKASHI

IPC: G03F7/027 ,  G03F7/00 ,  G03F7/028 ,  G03F7/033 ,  G03F7/32

Abstract: A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises: (1) a granular copolymer produced by polymerizing a monomer mixture comprising: (i) an aliphatic conjugated diene monomer; (ii) a monomer expressed by the general formula (I): (in which R represents a hydrogen atom or a methyl group, R represents an alkylene group having a carbon number of 3 to 20, and l represents an integer of 1 to 20); (iii) a monomer having at least two addition-polymerizable groups, and (iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable; (2) a photo-polymerizable unsaturated monomer; (3) an amino group-containing compound, and (4) a photo-polymerization initiator.

公开(公告)号：DE69522786D1

公开(公告)日：2001-10-25

申请号：DE69522786

申请日：1995-12-05

Applicant: NIPPON PAINT CO LTD ,  JSR CORP

Inventor： KANDA KAZUNORI ,  UEDA KOICHI ,  KAKIUCHI TADAHIRO ,  MURAMOTO HISAICHI ,  YASUDA KENJI ,  SATO HOZUMI ,  KOSHIMURA KATSUO ,  NISHIOKA TAKASHI

IPC: G03F7/027 ,  G03F7/00 ,  G03F7/028 ,  G03F7/033 ,  G03F7/32

Abstract: A photosensitive resin composition is provided which is excellent in water developability, impact resilience, resin plate strength after exposure, breaking extension, and resin-plate transparency. The composition comprises: (1) a granular copolymer produced by polymerizing a monomer mixture comprising: (i) an aliphatic conjugated diene monomer; (ii) a monomer expressed by the general formula (I): (in which R represents a hydrogen atom or a methyl group, R represents an alkylene group having a carbon number of 3 to 20, and l represents an integer of 1 to 20); (iii) a monomer having at least two addition-polymerizable groups, and (iv) an addition-polymerizable monomer other than (i), (ii) and (iii), if desirable; (2) a photo-polymerizable unsaturated monomer; (3) an amino group-containing compound, and (4) a photo-polymerization initiator.