SOLUTION OF RADIATION SENSITIVE RESIN COMPOSITION AND METHOD FOR IMPROVING SHELF STABILITY OF THE SAME

    公开(公告)号:JP2002244295A

    公开(公告)日:2002-08-30

    申请号:JP2001039066

    申请日:2001-02-15

    Applicant: JSR CORP

    Abstract: PROBLEM TO BE SOLVED: To provide a solution of a radiation sensitive resin composition having a controlled low water content, not causing the hydrolysis of a carboxylic anhydride structure in the resin and excellent in long-term shelf stability and to provide a method for improving the shelf stability of a solution of a radiation sensitive resin composition containing a resin having a carboxylic anhydride structure. SOLUTION: The solution of a radiation sensitive resin composition contains (A) an acid dissociable group-containing resin having a carboxylic anhydride structure and made alkali-soluble when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent and has

Patent Agency Ranking