公开(公告)号：WO2014124158A3

公开(公告)日：2015-01-15

申请号：PCT/US2014015135

申请日：2014-02-06

Applicant: KLA TENCOR CORP

Inventor： WANG DAIMIAN ,  WANG LI ,  ALLES DAVID

IPC: G03F1/84 ,  G03F7/00 ,  H01L21/027

CPC classification number: G03F1/24 ,  G01N21/956 ,  G01N2021/95676 ,  G03F1/22 ,  G03F1/84 ,  G03F7/70033

Abstract: An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array.

Abstract translation: 一种极光紫外线（EUM）掩模检查系统，包括沿着光轴投射EUV光的光源，用于接收来自源的EUV光的照明系统，该照明系统包括光谱纯度滤光片（SPF），SPF透射 所述EUV光的第一部分沿光轴朝向掩模，并且所述SPF包括多个至少部分反射元件，所述元件将所述EUV光的第二部分反射离开所述光轴，所述投影系统适于接收所述第一 所述EUV光在其照亮所述掩模之后的部分，适于接收所述图像的第一检测器阵列，以及用于接收所述EUV光的第二部分的第二检测器阵列。 SPF可以包括一个或多个多层干涉型滤波器。 或者，SPF包括设置在掠入射镜阵列上的薄膜滤光器。

公开(公告)号：EP2839505A4

公开(公告)日：2015-11-25

申请号：EP13777897

申请日：2013-04-15

Applicant: KLA TENCOR CORP

Inventor： SUBRAHMANYAN PRADEEP ,  WACK DANIEL ,  WRIGHT MICHAEL ,  ALLES DAVID

IPC: H01L21/68 ,  H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.

公开(公告)号：EP2954374A4

公开(公告)日：2016-12-07

申请号：EP14748855

申请日：2014-02-06

Applicant: KLA-TENCOR CORP

Inventor： WANG DAIMIAN ,  WANG LI ,  ALLES DAVID

IPC: G03F1/84 ,  G01N21/956 ,  G03F1/22 ,  G03F1/24 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F1/24 ,  G01N21/956 ,  G01N2021/95676 ,  G03F1/22 ,  G03F1/84 ,  G03F7/70033