公开(公告)号：EP2754213A4

公开(公告)日：2015-06-03

申请号：EP12830191

申请日：2012-09-06

Applicant: KLA TENCOR CORP

Inventor： DELGADO GILDARDO ,  WACK DANIEL

IPC: H05G2/00 ,  G03F7/20

CPC classification number: G03F7/70033 ,  H05G2/005 ,  H05G2/008

公开(公告)号：EP3025565A4

公开(公告)日：2017-05-24

申请号：EP14829857

申请日：2014-07-21

Applicant: KLA-TENCOR CORP

Inventor： BYKANOV ALEXANDER ,  KHODYKIN OLEG ,  WACK DANIEL ,  TSIGUTKIN KONSTANTIN ,  HALE LAYTON ,  WALSH JOSEPH ,  CHILESE FRANK

IPC: G03F7/20 ,  G01J1/16 ,  G01N21/956 ,  G03F1/84 ,  G21B1/23 ,  G21K5/00 ,  H01L21/027 ,  H05G2/00

CPC classification number: H05G2/008 ,  G01J1/16 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G03F1/84 ,  G03F7/70033 ,  G03F7/70891 ,  H05H2240/00

Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.

Abstract translation: EUV光源包括具有用等离子体形成靶材涂覆的表面的可旋转圆柱对称元件，配置成产生一个或多个激光脉冲的驱动激光源，该激光脉冲足以通过激励 等离子体形成靶材料，一组聚焦光学器件，其被配置为将所述一个或多个激光脉冲聚焦到所述可旋转圆柱对称元件的表面上;一组收集光学器件，其被配置为接收从所产生的等离子体发出的EUV光并且被进一步配置 以将照明引导至中间焦点;以及气体管理系统，其包括气体供应子系统，所述气体供应子系统被配置为将等离子体形成目标材料供应至所述可旋转圆柱对称元件的表面。

公开(公告)号：EP2836817A4

公开(公告)日：2016-03-30

申请号：EP13776111

申请日：2013-04-08

Applicant: KLA TENCOR CORP

Inventor： CHILESE FRANK ,  WACK DANIEL ,  FOWLER DOUGLAS

IPC: G01N21/33 ,  G03F7/20

CPC classification number: G03F7/20 ,  G01N2021/95676 ,  G03F1/22 ,  G03F1/84 ,  G03F7/70875 ,  G03F7/70891

公开(公告)号：EP2839505A4

公开(公告)日：2015-11-25

申请号：EP13777897

申请日：2013-04-15

Applicant: KLA TENCOR CORP

Inventor： SUBRAHMANYAN PRADEEP ,  WACK DANIEL ,  WRIGHT MICHAEL ,  ALLES DAVID

IPC: H01L21/68 ,  H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.