公开(公告)号：JP2011155302A

公开(公告)日：2011-08-11

申请号：JP2011103027

申请日：2011-05-02

Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー コーポレイション

Inventor： MIEHER WALTER D ,  LEVY ADY ,  GOLOVANEVSKY BORIS ,  FRIEDMANN MICHAEL ,  SMITH IAN ,  ADEL MICHAEL ,  FABRIKANT ANATOLY ,  BEVIS CHRISTOPHER F ,  FIELDEN JOHN ,  BAREKET NOAH ,  GROSS KENNETH P ,  ZALICKI PIOTR ,  WACK DAN ,  DECECCO PAOLA ,  GHINOVKER MARK ,  MOSHE BARUCH ,  KNOLL NOAM

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

Abstract: PROBLEM TO BE SOLVED: To provide a method of determining an overlay error between two layers of a multiple layer sample. SOLUTION: For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error between the first and second structures is determined by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets. The optical system includes any one or more of a reflectometric system, polarimetric system, imaging system, interferometric system and/or scan angle system. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种确定多层样品的两层之间的覆盖误差的方法。 解决方案：对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标，采用光学系统，从而测量来自每个 定期目标。 在第一和第二结构之间有预定义的偏移。 通过使用基于预定义的偏移的散射测量覆盖技术来分析来自周期性目标的所测量的光信号来确定第一和第二结构之间的重叠误差。 光学系统包括反射测量系统，偏振系统，成像系统，干涉系统和/或扫描角度系统中的任何一个或多个。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：SG11201708137VA

公开(公告)日：2017-11-29

申请号：SG11201708137V

申请日：2016-04-06

Applicant: KLA TENCOR CORP

Inventor： SMITH MARK D ,  SOLOMON JOSE ,  SHERWIN STUART ,  MIEHER WALTER D ,  LEVY ADY

IPC: H01L21/66 ,  H01L21/687

Abstract: The determination of in-plane distortions of a substrate includes measuring one or more out-of-plane distortions of the substrate in an unchucked state, determining an effective film stress of a film on the substrate in the unchucked state based on the measured out-of-plane distortions of the substrate in the unchucked state, determining in-plane distortions of the substrate in a chucked state based on the effective film stress of the film on the substrate in the unchucked state and adjusting at least one of a process tool or an overlay tool based on at least one of the measured out-of-plane distortions or the determined in-plane distortions.

公开(公告)号：WO2014143312A2

公开(公告)日：2014-09-18

申请号：PCT/US2013076706

申请日：2013-12-19

Applicant: KLA TENCOR CORP

Inventor： MIEHER WALTER D ,  CARROLL ALLEN

CPC classification number: G03F7/2059 ,  G03F1/20 ,  G03F7/70633 ,  H01J37/3045 ,  H01J37/3174

Abstract: One embodiment relates to a method of measuring overlay errors for a programmable pattern, area-imaging electron beam lithography apparatus. Patterned cells of an overlay measurement target array may be printed in swaths such that they are superposed on patterned cells of a first (base) array. In addition, the overlay array may have controlled-exposure areas distributed within the swaths. The superposed cells of the overlay and base arrays are imaged. The overlay errors are then measured based on distortions between the two arrays in the image data. Alternatively, non-imaging methods, such as using scatterometry, may be used. Another embodiment relates to a method for correcting overlay errors for an electron beam lithography apparatus. Overlay errors for a pattern to be printed are determined based on within-swath exposure conditions. The pattern is then pre-distorted to compensate for the overlay errors. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及一种测量可编程图案，面积成像电子束光刻设备的重叠误差的方法。 覆盖测量目标阵列的图案化单元可以以条状印刷，使得它们叠加在第一（基底）阵列的图案化单元上。 此外，叠加阵列可以具有分布在条带内的受控曝光区域。 覆盖层和基底阵列的叠加单元被成像。 然后基于图像数据中的两个阵列之间的失真来测量重叠误差。 或者，可以使用诸如使用散射法的非成像方法。 另一实施例涉及一种用于校正电子束光刻设备的覆盖误差的方法。 基于条纹曝光条件确定要打印的图案的叠加错误。 然后，该图案被预失真以补偿重叠错误。 还公开了其它实施例，方面和特征。