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1.发明公开LINEAR STAGE AND METROLOGY ARCHITECTURE FOR REFLECTIVE ELECTRON BEAM LITHOGRAPHY 审中-公开线性步长和测量基础结构反映电子光刻
公开(公告)号：EP2859577A4
公开(公告)日：2016-05-25
申请号：EP13804795
申请日：2013-06-12
Applicant: KLA TENCOR CORP
Inventor： UMMETHALA UPENDRA , HALE LAYTON , CLYNE JOSH , NAYFEH SAMIR , WILLIAMS MARK , DIREGOLO JOSEPH , WILSON ANDREW
IPC: H01L21/027 , G03F7/20
CPC classification number: G01B11/02 , B82Y10/00 , B82Y40/00 , G01B11/14 , G01B21/16 , G03F7/70716 , G03F7/70775 , G03F7/70816 , H01J37/20 , H01J37/244 , H01J37/3174 , H01J2237/2445 , H01J2237/24578 , H01J2237/30433 , H01J2237/30438
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2.发明公开LINEAR STAGE FOR REFLECTIVE ELECTRON BEAM LITHOGRAPHY 审中-公开电子科技大学学报（社会科学版）ELEKTRONENSTRAHL-LITHOGRAPHIE
公开(公告)号：EP2754173A4
公开(公告)日：2015-01-28
申请号：EP12829998
申请日：2012-09-06
Applicant: KLA TENCOR CORP
Inventor： UMMETHALA UPENDRA , HALE LAYTON , CLYNE JOSHUA , NAYFEH SAMIR , WILLIAMS MARK , DIREGOLO JOSEPH , WILSON ANDREW
IPC: H01L21/673
CPC classification number: G03F7/70716 , B82Y10/00 , B82Y40/00 , G03F7/70758 , G03F7/70766 , H01J37/20 , H01J37/3174 , H01J2237/20221 , H01J2237/31774 , H01J2237/31789
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