웨이퍼의 에지 검사 및 검토를 위한 방법 및 시스템
    1.
    发明公开
    웨이퍼의 에지 검사 및 검토를 위한 방법 및 시스템 审中-公开
    用于边缘检查和审查晶片的方法和系统

    公开(公告)号:KR20180030236A

    公开(公告)日:2018-03-21

    申请号:KR20187006797

    申请日:2016-08-10

    Abstract: 샘플의에지부분을검사또는검토하기위한전자-광학시스템은, 하나이상의전자빔을생성하도록구성된전자빔 소스, 샘플을고정시키도록구성된샘플스테이지, 및하나이상의전자빔의적어도부분을샘플의에지부분상으로지향시키도록구성된전자-광학요소들의세트를포함하는전자-광학칼럼을포함한다. 상기시스템은또한, 샘플주위에배치된샘플위치기준디바이스및 하나이상의프린지필드를보상하기위하여샘플의에지와샘플위치기준디바이스사이에배치된가드링 디바이스를포함한다. 가드링 디바이스의하나이상의특성이조절가능하다. 상기시스템은또한샘플의표면으로부터나오는전자를검출하도록구성된검출기어셈블리를포함한다.

    Abstract translation: E代表检查或查看抽样光学系统,被配置为生成至少一个电子束的电子束源的边缘部分,将至少所述样品台的一部分,和至少一个电子束被构造成固定所述样品,以该部分粉末状物质的样品中的 包括一组电光元件的光学元件,所述电光元件被配置为照射衬底。 该系统还包括设置在样本周围的样本位置参考装置以及设置在样本边缘和样本位置参考装置之间以补偿一个或多个边缘场的防护环装置。 保护环装置的至少一个特征是可调整的。 该系统还包括被配置为检测来自样品表面的电子的检测器组件。

    METHOD AND SYSTEM FOR EDGE-OF-WAFER INSPECTION AND REVIEW

    公开(公告)号:SG10201913242YA

    公开(公告)日:2020-03-30

    申请号:SG10201913242Y

    申请日:2016-08-10

    Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

Patent Agency Ranking