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    MEASURING OVERLAY AND PROFILE ASYMMETRY USING SYMMETRIC AND ANTI-SYMMETRIC SCATTEROMETRY SIGNALS
    1.
    发明申请
    MEASURING OVERLAY AND PROFILE ASYMMETRY USING SYMMETRIC AND ANTI-SYMMETRIC SCATTEROMETRY SIGNALS 审中-公开
    使用对称和对称分析信号测量覆盖和轮廓不对称

    公开(公告)号：WO2006133258A3

    公开(公告)日：2007-03-29

    申请号：PCT/US2006022059

    申请日：2006-06-06

    Applicant: KLA TENCOR TECH CORP ,  KANDEL DANIEL ,  GROSS KEN ,  FRIEDMANN MICHAEL ,  FU JIYOU ,  KRISHNAN SHANKAR ,  GOLOVANEVSKY BORIS

    Inventor： KANDEL DANIEL ,  GROSS KEN ,  FRIEDMANN MICHAEL ,  FU JIYOU ,  KRISHNAN SHANKAR ,  GOLOVANEVSKY BORIS

    IPC: G01J4/00

    CPC classification number: G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70633

    Abstract: Systems and methods are disclosed for using ellipsometer configurations to measure the partial Mueller matrix and the complete Jones matrix of a system that may be isotropic or anisotropic. In one embodiment two or more signals, which do not necessarily satisfy any symmetry assumptions individually, are combined into a composite signal which satisfies a symmetry assumption. The individual signals are collected at two or more analyzer angles. Symmetry properties of the composite signals allow easy extraction of overlay information for any relative orientation of the incident light beam with respect to a ID grating target, as well as for targets comprising general 2D gratings. Signals of a certain symmetry property also allow measurement of profile asymmetry in a very efficient manner. In another embodiment a measurement methodology is defined to measure only signals which satisfy a symmetry assumption. An optional embodiment comprises a single polarization element serving as polarizer (111) and analyzer (115). Another optional embodiment uses an analyzing prism (144) to simultaneously collect two polarization components of reflected light.

    Abstract translation: 公开了使用椭偏仪配置来测量可能是各向同性或各向异性的系统的部分Mueller矩阵和完整琼斯矩阵的系统和方法。 在一个实施例中，不一定满足任何对称假设的两个或更多个信号被组合成满足对称假设的复合信号。 各个信号以两个或多个分析器角度收集。 复合信号的对称属性允许容易地提取用于入射光束相对于ID光栅目标的任何相对取向以及包括通用2D光栅的目标的覆盖信息。 具有某种对称性质的信号也可以以非常有效的方式测量轮廓不对称。 在另一个实施例中，测量方法被定义为仅测量满足对称假设的信号。 可选实施例包括用作偏振器（111）和分析器（115）的单个偏振元件。 另一个可选实施例使用分析棱镜（144）同时收集反射光的两个偏振分量。

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