公开(公告)号：WO2012096847A3

公开(公告)日：2012-11-01

申请号：PCT/US2012020504

申请日：2012-01-06

Applicant: KLA TENCOR CORP ,  WACK DANIEL C ,  KVAMME DAMON F ,  ROGERS JOHN R ,  MCGUIRE JAMES P JR ,  RODGERS JOHN M

Inventor： WACK DANIEL C ,  KVAMME DAMON F ,  ROGERS JOHN R ,  MCGUIRE JAMES P JR ,  RODGERS JOHN M

IPC: G03F1/22 ,  G03F1/24

CPC classification number: G03F1/84 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24

Abstract: One embodiment relates to an apparatus that includes an illumination source (102) for illuminating a target substrate (106), objective optics (108) for projecting the EUV light which is reflected from the target substrate, and a sensor (110) for detecting the projected EUV light. The objective optics includes a first mirror (202,302, or 402) which is arranged to receive and reflect the EUV light which is reflected from the target substrate, a second mirror (204, 304, or 404) which is arranged to receive and reflect the EUV light which is reflected by the first mirror, a third mirror (206, 306, or 406) which is arranged to receive and reflect the EUV light which is reflected by the second mirror, and a fourth mirror (208, 308, or 408) which is arranged to receive and reflect the EUV light which is reflected by the third mirror.

Abstract translation: 一个实施例涉及一种装置，其包括用于照射目标基板（106）的照明源（102），用于投射从目标基板反射的EUV光的物镜（108）和用于检测目标基板 预计EUV灯。 物镜包括第一反射镜（202,302或402），第一反射镜（202,302或402）被布置成接收和反射从目标基底反射的EUV光，第二反射镜（204,304或404），其布置成接收和反射 由第一反射镜反射的EUV光，被配置为接收和反射由第二反射镜反射的EUV光的第三反射镜（206,306或406）和第四反射镜（208,308或408） ），其被布置成接收和反射由第三反射镜反射的EUV光。

公开(公告)号：EP2663897A4

公开(公告)日：2018-01-03

申请号：EP12734716

申请日：2012-01-06

Applicant: KLA-TENCOR CORP

Inventor： WACK DANIEL C ,  KVAMME DAMON F ,  ROGERS JOHN R ,  MCGUIRE JAMES P JR ,  RODGERS JOHN M

IPC: G03F1/22 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/84

CPC classification number: G03F1/84 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24

Abstract: One embodiment relates to an apparatus that includes an illumination source (102) for illuminating a target substrate (106), objective optics (108) for projecting the EUV light which is reflected from the target substrate, and a sensor (110) for detecting the projected EUV light. The objective optics includes a first mirror (202,302, or 402) which is arranged to receive and reflect the EUV light which is reflected from the target substrate, a second mirror (204, 304, or 404) which is arranged to receive and reflect the EUV light which is reflected by the first mirror, a third mirror (206, 306, or 406) which is arranged to receive and reflect the EUV light which is reflected by the second mirror, and a fourth mirror (208, 308, or 408) which is arranged to receive and reflect the EUV light which is reflected by the third mirror.