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1.
公开(公告)号:WO02054152A2
公开(公告)日:2002-07-11
申请号:PCT/US0146914
申请日:2001-12-06
Applicant: KODAK POLYCHROME GRAPHICS CO
Inventor: HAUCK GERHARD , NEBLER NILS , RUDOLPH HEINFRIED
IPC: B05D1/04 , C09D131/04 , C09D133/02 , C09D139/06 , G03F7/09
CPC classification number: B05D1/04 , C09D131/04 , C09D133/02 , C09D139/06
Abstract: A method for applying a matting layer to a radiation-sensitive layer of a printing plate precursor comprises: (a) providing a matting composition comprising a polymer and a solvent, wherein the matting composition has a solid content of more than 10% and no more than 50% by weight based on the total composition; and (b) spraying the matting composition on the radiation-sensitive layer using an electrostatically aided rotary atomizer having a bell speed of more than 10,000 rpm, wherein the distance between the bell and the radiation-sensitive layer to be coated is less than 50 cm.
Abstract translation: 将消光层施加到印版前体的辐射敏感层的方法包括:(a)提供包含聚合物和溶剂的消光组合物,其中所述消光组合物的固体含量大于10%且不超过 基于总组合物重量的50%; 以及(b)使用具有大于10,000rpm的钟速的静电辅助旋转雾化器将消光组合物喷射在辐射敏感层上,其中钟罩和待涂布的辐射敏感层之间的距离小于50cm 。
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公开(公告)号:AU2002225970A1
公开(公告)日:2002-07-16
申请号:AU2002225970
申请日:2001-12-06
Applicant: KODAK POLYCHROME GRAPHICS CO
Inventor: NEBLER NILS , RUDOLPH HEINFRIED , HAUCK GERHARD
IPC: B05D1/04 , C09D131/04 , C09D133/02 , C09D139/06 , G03F7/115
Abstract: A method for applying a matting layer to a radiation-sensitive layer of a printing plate precursor is disclosed. The method comprises: (a) providing a matting composition comprising a polymer and a solvent, wherein the matting composition has a solid content of more than 10% and no more than 50% by weight based on the total composition; and (b) spraying the matting composition on the radiation-sensitive layer using an electrostatically aided rotary atomizer having a bell speed of more than 10,000 rpm, wherein the distance between the bell and the radiation-sensitive layer to be coated is less than 30 cm. The printing plate precursor may be in the form of a moving web. The method of the present invention can be used for matting any kind of radiation-sensitive layer of conventional positive and negative working lithographic printing plate precursors.
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