AVALANCHE PHOTODIODE PROVIDED WITH AMPLIFICATION LAYER OF SUPERLATTICE STRUCTURE

    公开(公告)号:JPH06244451A

    公开(公告)日:1994-09-02

    申请号:JP31815793

    申请日:1993-12-17

    Abstract: PURPOSE: To prevent unevenness and a decrease in steepness of a hetero-junction boundary surface, to reduce dark current due to tunneling, and to make an internal gain large by using an InAlAs/InGaAs superlattice structure as an amplification layer. CONSTITUTION: On an n -InP epitaxial layer 11 formed as a buffer layer on a substrate 10, an n-type InAlAs layer 12 is formed, and an it, an n -InAlAs layer 13 is formed while being relatively high in impurity density. On this layer 13, aon amplification layer 14 is further formed which has an InGaAs/InAlAs superlattice structure. On the amplification layer 14, p-type InAlAs layers 15 and 16, an absorption layer 17 of InGaAs, a p-type InP layer 18 for reducing the quantity of a surface leakage current, and an InGaAs layer 19 for ohmic junction are successively formed in order. Consequently, an epitaxial layer having high quality and accurate thickness and density is grown.

    RWG TYPE SEMICONDUCTOR LASER DEVICE AND MANUFACTURE THEREOF

    公开(公告)号:JPH06237046A

    公开(公告)日:1994-08-23

    申请号:JP31815993

    申请日:1993-12-17

    Abstract: PURPOSE: To improve the performance characteristic of a semiconductor laser by bringing p-electrode metal stripes into contact with an ohmic contact layer in wide areas, making the ohmic contact resistance smaller, narrowing the width of a ridge, reducing heat generation and reducing an oscillation critical current. CONSTITUTION: A ridge is formed in a semiconductor epitaxial layer composed by forming an active layer 32, an optical waveguide layer 33, a clad layer 34, and an ohmic contact layer 35 successively on an n-InP substrate 31, and p-electrode metal stripes 38 having the same width with the width r of the upper layer of this ridge, a dielectric substance 38 having ohmic contact stripes of a width w (w

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