公开(公告)号：US20160274018A1

公开(公告)日：2016-09-22

申请号：US15169067

申请日：2016-05-31

Applicant: Korea Research Institute of Standards and Science

Inventor： Dae-Jin Seong ,  Yong-Hyeon Shin ,  In-Tae Lim

IPC: G01N15/08

CPC classification number: G01N15/08 ,  G01N15/0826

Abstract: A gas permeability measurement apparatus and a gas permeability measurement method, including a first chamber filled with a measurement gas and maintained at a constant pressure, a second chamber connected in series to the first chamber, a third chamber connected in series to the second chamber, and a separating plate having a through-hole and separating the second chamber and the third chamber from each other. A conductance adjusting part is disposed between the second and third chambers to adjust conductance passing through the through-hole of the separating plate. A vacuum pump is connected to the third chamber to exhaust the third chamber. A differential pressure gauge measures differential pressure between the second and third chambers. A sample is disposed between the first and second chambers. The measurement gas is delivered to the second chamber after permeating the sample, and the conductance adjusting part sequentially provides at least two different conductances.

Abstract translation: 一种气体渗透性测量装置和气体透过率测量方法，包括：填充有测量气体并保持恒定压力的第一腔室，与第一腔室串联连接的第二腔室，与第二腔室串联连接的第三腔室， 以及具有通孔并将第二腔室和第三腔室彼此分开的分离板。 电导调节部件设置在第二和第三室之间，以调节通过分离板的通孔的电导。 真空泵连接到第三室以排出第三室。 差压表测量第二和第三腔室之间的压力差。 样品设置在第一和第二室之间。 测量气体在渗透样品之后被输送到第二室，并且电导调节部分依次提供至少两个不同的电导。

公开(公告)号：US11211231B2

公开(公告)日：2021-12-28

申请号：US16461687

申请日：2018-01-02

Applicant: Korea Research Institute of Standards and Science

Inventor： Hyo Chang Lee ,  Jung-Hyung Kim ,  Dae-Jin Seong

IPC: H01J37/32 ,  H05H1/24 ,  H05H1/46

Abstract: A plasma generation apparatus includes a plasma generation unit. The plasma generation unit has a spherical or elliptical cavity. The plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity. The cavity has a plasma extraction hole to communicate with an external space.

公开(公告)号：US20140148014A1

公开(公告)日：2014-05-29

申请号：US14082823

申请日：2013-11-18

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： ShinJae You ,  Jung-Hyung Kim ,  Yong-Hyung Shin ,  Dae-Jin Seong ,  Daewoong Kim

IPC: H01L21/311

CPC classification number: H01L21/31116 ,  H01J37/32357 ,  H01J37/32568 ,  H01L21/02049

Abstract: A substrate processing apparatus and method includes a chamber, a remote plasma source outside the chamber to provide activated ammonia and activated hydrogen fluoride into the chamber, and a direct plasma source to provide ion energy to a substrate inside the chamber. The plasma source includes ground electrodes extending in a first direction on a first plane perpendicularly spaced apart from a plane on which the substrate is disposed and defined by the first direction and a second direction perpendicular to the first direction and power electrodes disposed between the ground electrodes, extending in the first direction parallel to each other and receiving power from an RF power source to generate plasma between adjacent ground electrodes. The activated ammonia and the activated hydrogen fluoride are supplied on the substrate through a space between the power electrode and the ground electrode.

Abstract translation: 基板处理装置和方法包括：腔室，室外的远程等离子体源，以将激活的氨和活化的氟化氢提供到腔室中，以及直接等离子体源，以向腔室内的基底提供离子能量。 等离子体源包括接地电极，该接地电极在垂直于第一平面间隔开的第一平面上延伸，该第一平面垂直于基板设置并由第一方向和垂直于第一方向的第二方向定义的平面间隔开，并且布置在接地电极 在第一方向上彼此平行延伸并且从RF电源接收功率以在相邻接地电极之间产生等离子体。 活性氨和活性氟化氢通过电力电极和接地电极之间的空间在基板上供应。