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公开(公告)号:US10222695B2
公开(公告)日:2019-03-05
申请号:US15306990
申请日:2015-09-25
Inventor: Eun-Ah You
Abstract: Provided is a method for manufacturing a transparent substrate according to an exemplary embodiment of the present invention including: a) forming a photoresist layer satisfying D=m*(λ/2n); b) manufacturing a ring-shaped pattern by exposing the photoresist layer and developing the exposed photoresist layer, using a photo mask including a transparent base and a plate-type metal dot formed contacting a light emitting surface of the transparent base; c) manufacturing a second mold to which the ring-shaped pattern is reversely transferred by using a substrate on which the ring-shaped pattern is formed as a first mold; and d) manufacturing the transparent substrate in which a ring-shaped transparent protrusion is integrally formed with the transparent base by filling a liquefied transparent resin in the second mold and curing the transparent resin and removing the second mold to transfer the ring-shaped pattern.
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公开(公告)号:US12270762B2
公开(公告)日:2025-04-08
申请号:US16982850
申请日:2019-09-18
Inventor: Eun-Ah You , Wansun Kim , Tae Geol Lee
IPC: G01N21/65 , B82B1/00 , B82Y30/00 , B82Y40/00 , G01N33/483 , G01N33/553
Abstract: Provided is a Raman-active particle which is a Raman-active particle for surface-enhanced Raman analysis, the particle including: a spherical plasmonic metal core; a plasmonic metal shell having surface unevenness; and a self-assembled monolayer which is bonded to each of the core and the shell and positioned between the core and the shell, and includes a Raman reporter.
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公开(公告)号:US20170307980A1
公开(公告)日:2017-10-26
申请号:US14895180
申请日:2015-06-09
Inventor: Eun-Ah You
CPC classification number: G03F7/2004 , G03F1/00 , G03F1/50 , G03F7/00 , G03F7/038 , G03F7/039 , G03F7/162 , G03F7/32
Abstract: Provided is a photolithography method, including: a) forming a photoresist layer satisfying D=m*(λ/2n) (D is a thickness of the photoresist layer, n is a refractive index of the photoresist, λ is a wavelength of irradiated light at the time of exposure, and m is a natural number of 1 or more) on a substrate; and b) manufacturing a photoresist pattern having a ring shape by exposing the photoresist layer and developing the exposed photoresist layer using a photo mask including a transparent substrate and a plate-type metal dot contacting a light emitting surface of the transparent substrate.
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公开(公告)号:US12013393B2
公开(公告)日:2024-06-18
申请号:US16498326
申请日:2018-10-10
Inventor: Eun-Ah You , Wansun Kim , Tae Geol Lee
IPC: G01N33/553 , B82Y30/00 , G01N33/543 , B82B1/00 , B82Y5/00 , B82Y15/00 , B82Y40/00 , G01N21/65
CPC classification number: G01N33/54346 , G01N33/553 , B82B1/008 , B82Y5/00 , B82Y15/00 , B82Y40/00 , G01N21/658
Abstract: Provided is a method of preparing Raman-active nanoparticles, which includes a) preparing a metal nanocore having a nano-star shape from a first reaction solution in which a first metal precursor is mixed with a buffer solution; b) fixing a Raman reporter in the metal nanocore; and c) forming a metal shell, which surrounds the nanocore in which the Raman reporter is fixed, from a second reaction solution in which a second metal precursor is mixed with the nanocore in which the Raman reporter is fixed. The Raman reporter has a binding affinity for each of a first metal of the metal nanocore and a second metal of the metal shell.
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公开(公告)号:US11479474B2
公开(公告)日:2022-10-25
申请号:US16498307
申请日:2018-10-23
Inventor: Eun-Ah You , Wansun Kim , Tae Geol Lee
IPC: C01G7/00 , G01N21/65 , B82B1/00 , G01N33/543 , G01N33/553 , B82Y30/00 , B82Y35/00 , B82Y40/00
Abstract: Provided is a method of preparing composite nanoparticles, which includes: a) preparing a metal nanocore having a nano-star shape from a first reaction solution in which a first metal precursor is mixed with a first buffer solution; b) fixing a Raman reporter in the metal nanocore; and c) forming a metal shell, which surrounds the nanocore in which the Raman reporter is fixed, from a second reaction solution in which the nanocore in which the Raman reporter is fixed, and a second metal precursor are mixed with a second buffer solution.
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公开(公告)号:US12140547B2
公开(公告)日:2024-11-12
申请号:US17587541
申请日:2022-01-28
Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE , VIRGINIA TECH INTELLECTUAL PROPERTIES, INC.
Inventor: Eun-Ah You , Zhou Wei , Wonil Nam , Wansun Kim
Abstract: The present disclosure relates to a surface-enhanced Raman spectroscopy complex probe capable of effectively detecting a catecholamine compound even at extremely low concentrations. The complex probe includes a nanolaminate including a nanogap and metal nanoparticles. In this case, the nanolaminate and the metal nanoparticles are modified to a compound that may be bound to each functional group included in catecholamine, and thus, catecholamine included in an analyte is doubly recognized by the complex probe. In addition, since a hotspot emitting a strong SERS signal is formed by a nanogap included in a nanolaminate, it is possible to effectively detect a catecholamine compound even at extremely low concentrations.
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公开(公告)号:US10108092B2
公开(公告)日:2018-10-23
申请号:US14895180
申请日:2015-06-09
Inventor: Eun-Ah You
Abstract: Provided is a photolithography method, including: a) forming a photoresist layer satisfying D=m*(λ/2n) (D is a thickness of the photoresist layer, n is a refractive index of the photoresist, λ is a wavelength of irradiated light at the time of exposure, and m is a natural number of 1 or more) on a substrate; and b) manufacturing a photoresist pattern having a ring shape by exposing the photoresist layer and developing the exposed photoresist layer using a photo mask including a transparent substrate and a plate-type metal dot contacting a light emitting surface of the transparent substrate.
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公开(公告)号:US09795982B2
公开(公告)日:2017-10-24
申请号:US14892900
申请日:2015-05-19
Inventor: Eun-Ah You
Abstract: An apparatus for dipping a substrate includes: a body having an internal plate formed therein, and including a backing plate provided over the internal plate; a crucible accommodating an aqueous solution therein and provided over the backing plate; a crucible driving unit provided in the body and connected to the crucible to move the crucible in a horizontal direction or a vertical direction of the body; a support having a lower end to which a substrate is fixed; a support driving unit provided to an upper side of the body and connected to the support to drive the support in a length direction of the support or rotate the support in the vertical direction of the body; and a controlling unit connected to the crucible driving unit and the support driving unit to control driving of the crucible driving unit and the support driving unit.
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