公开(公告)号：WO2014025149A1

公开(公告)日：2014-02-13

申请号：PCT/KR2013/006711

申请日：2013-07-26

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： RHEE, Hyug-Gyo ,  YANG, Ho Soon ,  GHIM, Young Sik ,  LEE, Yun Woo

IPC: G02B5/18 ,  G03F7/26

CPC classification number: G02B5/1871 ,  G02B5/1857 ,  G03F7/70383

Abstract: The present invention relates to an apparatus for manufacturing a phase-type diffraction element using a direct laser exposure method, a method of manufacturing a phase-type diffraction element, and a phase-type diffraction element using a direct laser exposure method. More specifically, the present invention relates to an apparatus and method for manufacturing a phase-type diffraction element by radiating a laser beam on a substrate formed of photo-curable resin.

Abstract translation: 本发明涉及一种使用直接激光曝光方法制造相位衍射元件的装置，相型衍射元件的制造方法和使用直接激光曝光法的相位衍射元件。 更具体地，本发明涉及通过在由光固化树脂形成的基板上照射激光束来制造相型衍射元件的装置和方法。

公开(公告)号：WO2013058471A1

公开(公告)日：2013-04-25

申请号：PCT/KR2012/005899

申请日：2012-07-24

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE ,  RHEE, Hyug-Gyo ,  LEE, Yun Woo

Inventor： RHEE, Hyug-Gyo ,  LEE, Yun Woo

IPC: G03F7/20 ,  G03F7/26 ,  H01L21/027

CPC classification number: B29C59/16 ,  G03F7/70383 ,  G03F7/70408 ,  G03F7/70566

Abstract: The present invention relates to a fine pattern manufacturing apparatus using interference and a fine pattern manufacturing method using the fine pattern manufacturing apparatus, which can improve height direction resolution in a laser irradiation method. More specifically, the invention relates to a fine pattern manufacturing apparatus using interference and a fine pattern manufacturing method using the manufacturing apparatus, in which a height direction interference generation unit is included to interfere laser beams respectively having a different plane direction width, and height direction line width can be improved by irradiating an interference laser beam having an interference fringe direction of height direction on a photosensitive film.

Abstract translation: 本发明涉及使用干涉的精细图案制造装置和使用精细图案制造装置的精细图案制造方法，其能够提高激光照射方法中的高度方向分辨率。 更具体地，本发明涉及使用干涉的精细图案制造装置和使用该制造装置的精细图案制造方法，其中包括高度方向干涉产生单元以干扰分别具有不同的平面方向宽度的激光束和高度方向 可以通过在感光膜上照射具有高度方向的干涉条纹方向的干涉激光束来提高线宽。