公开(公告)号：WO2014025149A1

公开(公告)日：2014-02-13

申请号：PCT/KR2013/006711

申请日：2013-07-26

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： RHEE, Hyug-Gyo ,  YANG, Ho Soon ,  GHIM, Young Sik ,  LEE, Yun Woo

IPC: G02B5/18 ,  G03F7/26

CPC classification number: G02B5/1871 ,  G02B5/1857 ,  G03F7/70383

Abstract: The present invention relates to an apparatus for manufacturing a phase-type diffraction element using a direct laser exposure method, a method of manufacturing a phase-type diffraction element, and a phase-type diffraction element using a direct laser exposure method. More specifically, the present invention relates to an apparatus and method for manufacturing a phase-type diffraction element by radiating a laser beam on a substrate formed of photo-curable resin.

Abstract translation: 本发明涉及一种使用直接激光曝光方法制造相位衍射元件的装置，相型衍射元件的制造方法和使用直接激光曝光法的相位衍射元件。 更具体地，本发明涉及通过在由光固化树脂形成的基板上照射激光束来制造相型衍射元件的装置和方法。