Abstract:
The present invention relates to an apparatus for manufacturing a phase-type diffraction element using a direct laser exposure method, a method of manufacturing a phase-type diffraction element, and a phase-type diffraction element using a direct laser exposure method. More specifically, the present invention relates to an apparatus and method for manufacturing a phase-type diffraction element by radiating a laser beam on a substrate formed of photo-curable resin.
Abstract:
Provided is a dual optical-comb femtosecond optical fiber laser that includes an optical fiber resonator maintained at a polarization state, a wavelength division multiplexing coupler (WDM coupler) mounted on the optical fiber resonator to provide pump light to the optical fiber resonator, a pump light source adapted to output the pump light, a gain medium doping optical fiber, mode-locking means mounted on the optical fiber resonator to induce mode-locking, an isolator mounted on the optical fiber resonator to make light traveling into the optical fiber resonator travel in one direction, and a birefringent element mounted on the optical fiber resonator to provide different refractive indices according to a polarization state of the light traveling into the optical fiber resonator.
Abstract:
The present invention relates to a fine pattern manufacturing apparatus using interference and a fine pattern manufacturing method using the fine pattern manufacturing apparatus, which can improve height direction resolution in a laser irradiation method. More specifically, the invention relates to a fine pattern manufacturing apparatus using interference and a fine pattern manufacturing method using the manufacturing apparatus, in which a height direction interference generation unit is included to interfere laser beams respectively having a different plane direction width, and height direction line width can be improved by irradiating an interference laser beam having an interference fringe direction of height direction on a photosensitive film.
Abstract:
An apparatus for forming fine patterns by employing polarization interference in a laser scanning method comprises a laser generator; a calcite wave plate configured to refract at least one of the S wave and the P wave, polarized by the polarization plate, an analyzer configured to make coincident with each other the polarization directions of the S wave and the P wave having the paths spaced apart from each other by the calcite wave plate; an exposure lens; an exposure head; an X stage; and a rotation stage configured to move the substrate mounting unit around a Z axis which is a vertical axis.