公开(公告)号：AU3076400A

公开(公告)日：2000-08-18

申请号：AU3076400

申请日：2000-01-24

Applicant: KYOWA YUKA KK

Inventor： MURAYAMA TOSHIKAZU ,  GONNO AKIHIRO ,  IKUTA MASANORI ,  ITO KATSUHIRO ,  MURATA SHIGERU ,  MUTO KENJI

IPC: C08F20/38 ,  C08F220/18 ,  C08K5/46 ,  C08L101/06 ,  C08K5/17 ,  C09D201/06

公开(公告)号：AU2003262255A1

公开(公告)日：2004-03-11

申请号：AU2003262255

申请日：2003-08-20

Applicant: KYOWA YUKA KK

Inventor： SHIMIZU IKUO ,  YAMAOKA TSUGUO ,  ITO KATSUHIRO ,  IWASAKI TSUYOSHI

IPC: G03F7/039 ,  C08F20/26 ,  G03F7/004

公开(公告)号：EP1426041A4

公开(公告)日：2005-01-05

申请号：EP02767848

申请日：2002-08-21

Applicant: KYOWA YUKA KK

Inventor： FUKUDA YUKITOSHI ,  SHIMIZU IKUO ,  ITO KATSUHIRO ,  OSADA KAZUYASU ,  TAKAHASHI TOMOYA

IPC: A61K8/35 ,  A61K8/37 ,  A61Q1/02 ,  A61Q1/06 ,  A61Q5/00 ,  A61Q17/04 ,  A61Q19/00 ,  C07C69/34 ,  A61K7/42 ,  A61K7/06 ,  A61K7/48

CPC classification number: A61Q19/00 ,  A61K8/35 ,  A61K8/37 ,  A61Q5/00 ,  A61Q17/04 ,  C07C69/34

Abstract: The present invention provides oils for cosmetics comprising a dibasic acid diester represented by general formula (I) (wherein R , R , R and R , which are the same or different, each represent lower alkyl) and excellent in solubility of a long-wave ultraviolet light absorber or the like, and so forth.

公开(公告)号：EP1415968A4

公开(公告)日：2004-12-08

申请号：EP02746017

申请日：2002-07-12

Applicant: KYOWA YUKA KK

Inventor： SHIMIZU IKUO ,  ITO KATSUHIRO ,  OSADA KAZUYASU ,  YAMAOKA TSUGUO

IPC: C07C41/54 ,  C07C67/04 ,  G03F7/039 ,  C07B51/00 ,  C07C43/303 ,  C07C43/305 ,  C07C69/54

CPC classification number: G03F7/0392 ,  C07C67/04 ,  C07C69/54

Abstract: A process by which an ether compound useful in chemical amplification type resist compositions, as an intermediate for medicines, in coating materials, or in other applications can be produced in high yield while diminishing side reactions. The process, which is for producing an ether compound having a group represented by the general formula (II): (II) (wherein R1, R2, and R3 are the same or different and each represents (un)saturated alkyl, (un)saturated aryl, or (un)saturated aralkyl, provided that R1 and R2 may form a cycloalkyl in cooperation with the adjacent carbon atom), is characterized by reacting a compound having a hydroxy (or carboxy) group with an alkenyl ether represented by the general formula (I): (I) (wherein R1, R2, and R3 are the same as defined above).

公开(公告)号：EP1449823A4

公开(公告)日：2005-12-28

申请号：EP02801528

申请日：2002-10-10

Applicant: KYOWA YUKA KK

Inventor： FUKUDA YUKITOSHI ,  SHIMIZU IKUO ,  ITO KATSUHIRO ,  OSADA KAZUYASU

IPC: C07C69/34 ,  C10M105/36

CPC classification number: C07C69/34 ,  C10M105/36 ,  C10M2207/2825 ,  C10M2207/2855 ,  C10M2207/345 ,  C10N2220/10 ,  C10N2230/64 ,  C10N2230/66

Abstract: The present invention provides dibasic acid diesters, which are suitable for use in lubricating base oils, etc. and excellent in hydrolysis resistance, etc., represented by general formula (I): (wherein R and R , which may be the same or different, each represent lower alkyl; and R and R , which may be the same or different, each represent alkyl having 7 or more carbon atoms).

公开(公告)号：EP1167458A4

公开(公告)日：2003-01-22

申请号：EP00900882

申请日：2000-01-24

Applicant: KYOWA YUKA KK

Inventor： MURAYAMA TOSHIKAZU ,  GONNO AKIHIRO ,  IKUTA MASANORI ,  ITO KATSUHIRO ,  MURATA SHIGERU ,  MUTO KENJI

IPC: C08F20/38 ,  C08F220/18 ,  C08K5/46 ,  C08L101/06 ,  C08K5/17 ,  C09D201/06

CPC classification number: C08F20/38 ,  C08F2220/1825 ,  C08K5/46 ,  C08F2220/382 ,  C08F212/08

Abstract: A composition which comprises a compound having at least one five-membered dithiocarbonate ring group represented by general formula (I) (wherein R?1, R2, and R3¿ are the same or different and each represents hydrogen or lower alkyl) and either a secondary diamine represented by general formula (II) (wherein X represents C¿4-20? alkylene) or an enamine derivative thereof. It is useful in applicatios such as a coating composition, adhesive, ink, sealing material, and encapsulation material.

公开(公告)号：JP2000128891A

公开(公告)日：2000-05-09

申请号：JP30125898

申请日：1998-10-22

Applicant: KYOWA YUKA KK

Inventor： ITO KATSUHIRO ,  TANIZAKI JUNKO ,  FUKUDA YUKITOSHI ,  MATSUSHITA SEISHIROU

IPC: C07F9/50

Abstract: PROBLEM TO BE SOLVED: To obtain a cycloalkyldiaryphosphine in which the 2-position of a cycloalkyl is substituted with an alkyl by an industrially readily handleable method in a short process in a high yield by reacting a lithium diaryl phosphide with a cycloalkylsulfonate in an ether-based solvent. SOLUTION: A lithium diaryl phosphide of the formula LiPR1R2 (R1 and R2 are each a substituted or nonsubstituted aryl) is reacted with a cycloalkylsulfonate of the formula: R3OSO2R4 (R3 is a cycloalkyl substituted with an alkyl at the 2-position; R4 is a lower alkyl or phenyl substituted with a lower alkyl) in an ether-based solvent (a cyclic alkyl monoether preferably such as tetrahydrofuran, etc.), to give the objective compound of the formula. Preferably lithium diphenyl phosphide is reacted with menthyl mesylate or menthyl tosylate to give d-neomenthyldiphenylphosphine. The reaction temperature is preferably 25-35 deg.C.