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公开(公告)号：EP2929932A1
公开(公告)日：2015-10-14
申请号：EP13862200.6
申请日：2013-12-06
Applicant: Korea Basic Science Institute
Inventor： SEOK, Dong Chan , JUNG, Yong Ho , JEONG, Hyun Young
CPC classification number: H01J37/32532 , B01J19/088 , B01J2219/083 , B01J2219/0879 , H01J37/32009 , H01J37/32348 , H01J37/32568 , H05H1/2406 , H05H2001/2412 , H05H2001/2431
Abstract: A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a cylindrical surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the cylindrical surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode layer, and a plasma generating electrode disposed on the insulating layer, wherein the cylindrical surface discharge plasma module rotates, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the cylindrical surface discharge plasma module.
Abstract translation: 公开了一种粉末等离子体处理设备。 粉末等离子体处理装置是圆筒形表面放电等离子体模块的粉末等离子体处理装置，并且该装置包括用作圆柱形表面放电等离子体模块的外表面的板状电极层，设置在内表面上的绝缘层 以及设置在所述绝缘层上的等离子体产生电极，其中所述圆柱形表面放电等离子体模块旋转，交流电压施加到所述等离子体产生电极和所述板状电极层，以在所述等离子体产生电极和所述板状电极层周围产生等离子体 等离子体产生电极和用于等离子体处理的粉末由圆柱面放电等离子体模块内的等离子体处理。
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公开(公告)号：EP3255960A1
公开(公告)日：2017-12-13
申请号：EP16746881.8
申请日：2016-02-05
Applicant: Korea Basic Science Institute
Inventor： SEOK, Dong Chan , JUNG, Yong Ho , CHOI, Yong Sup , LHO, Taihyeop , LEE, Kang Il , JEONG, Hyun Young
Abstract: The present invention is to provide a plasma-generating source including a porous dielectric member partially immersed in liquid into a plasma generation region between two opposite electrodes for generating dielectric barrier discharge plasma, such that generation of ozone and nitrogen oxides is suppressed while generation of hydroxy radicals is promoted.
Abstract translation: 本发明提供一种等离子体发生源，其包括部分浸入液体中的多孔电介质构件，进入两个相对电极之间的等离子体产生区，用于产生电介质阻挡放电等离子体，从而抑制臭氧和氮氧化物的产生，同时产生羟基 自由基得到促进。
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公开(公告)号：EP2929932B1
公开(公告)日：2018-04-04
申请号：EP13862200.6
申请日：2013-12-06
Applicant: Korea Basic Science Institute
Inventor： SEOK, Dong Chan , JUNG, Yong Ho , JEONG, Hyun Young
CPC classification number: H01J37/32532 , B01J19/088 , B01J2219/083 , B01J2219/0879 , H01J37/32009 , H01J37/32348 , H01J37/32568 , H05H1/2406 , H05H2001/2412 , H05H2001/2431
Abstract: A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a cylindrical surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the cylindrical surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode layer, and a plasma generating electrode disposed on the insulating layer, wherein the cylindrical surface discharge plasma module rotates, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the cylindrical surface discharge plasma module.
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公开(公告)号：EP2929933A1
公开(公告)日：2015-10-14
申请号：EP13862922.5
申请日：2013-12-06
Applicant: Korea Basic Science Institute
Inventor： SEOK, Dong Chan , JUNG, Yong Ho , JEONG, Hyun Young
CPC classification number: H01J37/32568 , B01J19/088 , B01J2219/0835 , B01J2219/0879 , H01J37/32348 , H05H1/48 , H05H2001/2412
Abstract: A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus includes: a chamber configured to perform plasma processing on a powder; a powder supply unit disposed in an upper portion of the chamber; and a plurality of plate-like surface discharge plasma modules disposed below the powder supply unit and positioned within the chamber, wherein surfaces of the surface discharge plasma modules are spaced apart from each other. According to the powder plasma processing apparatus, the powder can be uniformly processed, and the time that the powder spends in contact with the plasma can be controlled, thereby allowing efficient powder processing to be performed.
Abstract translation: 公开了粉末等离子体处理装置。 粉末等离子体处理装置包括：室，被配置为对粉末进行等离子体处理; 设置在所述室的上部的粉末供给单元; 以及多个板状表面放电等离子体模块，其设置在所述粉末供给单元的下方并且位于所述室内，其中所述表面放电等离子体模块的表面彼此间隔开。 根据粉末等离子体处理装置，可以均匀地加工粉末，并且可以控制粉末与等离子体接触的时间，从而允许进行有效的粉末处理。
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